Dynamic Multi-Interference Lithography Incorporating Modulated Optical Fourier Transform System

Yan Ye; Yaqi Ma; Zhi Song; Chang Lu; Yishen Xu; Linsen Chen

doi:10.3788/AOS221892

Acta Optica Sinica, Volume. 43, Issue 8, 0822015(2023)

Dynamic Multi-Interference Lithography Incorporating Modulated Optical Fourier Transform System

Yan Ye^1,2, Yaqi Ma^1,2, Zhi Song^1,2, Chang Lu^1,2, Yishen Xu^1,2、*, and Linsen Chen^1,2、**

¹School of Optoelectronic Science and Engineering, Collaborative Innovation Center of Suzhou Nano Science and Technology, Soochow University, Suzhou 215006, Jiangsu, China

²Key Lab of Advanced Optical Manufacturing Technologies of Jiangsu Province, Key Lab of Modern Optical Technologies of Education Ministry of China, Soochow University, Suzhou 215006, Jiangsu, China

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Yan Ye, Yaqi Ma, Zhi Song, Chang Lu, Yishen Xu, Linsen Chen. Dynamic Multi-Interference Lithography Incorporating Modulated Optical Fourier Transform System[J]. Acta Optica Sinica, 2023, 43(8): 0822015

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Paper Information

Category: Optical Design and Fabrication

Received: Oct. 28, 2022

Accepted: Dec. 2, 2022

Published Online: Apr. 6, 2023

The Author Email: Yishen Xu (xys2001@suda.edu.cn), Linsen Chen (lschen@suda.edu.cn)

DOI:10.3788/AOS221892

Topics

laser devices and laser physics

Lasers and Laser Optics

Laser physics

laser manufacturing

Instrumentation, Measurement and Metrology