Laser & Optoelectronics Progress, Volume. 58, Issue 11, 1131001(2021)

Film Thickness Error in Electron Beam Evaporation with Revolving Structure

Ganghua Bao*, Ben Wang, Yujiang Xie, and Yu Liang
Author Affiliations
  • Shanghai Multiple Films & Laser Tech., Co., Ltd., Shanghai 201306, China
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    Figures & Tables(8)
    Polar coordinate diagram of non-cosine film thickness calculation
    Instantaneous film thickness distribution at polar coordinate system
    Physical thickness error distribution at different substrate positions
    Positions of samples
    Spectral curves of different locations with different ρ values. (a) ρ=0.6 m; (b) ρ=1.2 m
    • Table 1. Parameters of thin film coater with 2700 mm diameter

      View table

      Table 1. Parameters of thin film coater with 2700 mm diameter

      Parameter

      Diameter of vacuum

      chamber /mm

      R /mL /mH /mn
      Value27002.6000.9001.6502.5
    • Table 2. Uniform thickness distribution of thin films

      View table

      Table 2. Uniform thickness distribution of thin films

      ρ /mSample numberMgF2 film thickness /nmAl2O3 film thickness / nm
      0.61223186
      1.21#221185
    • Table 3. MgF2 thickness errors at different positions

      View table

      Table 3. MgF2 thickness errors at different positions

      ρ /mPeak reflectivity /%Inversion error /nm
      MinimumMaximum
      0.66.697.485.3
      1.26.417.527.0
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    Ganghua Bao, Ben Wang, Yujiang Xie, Yu Liang. Film Thickness Error in Electron Beam Evaporation with Revolving Structure[J]. Laser & Optoelectronics Progress, 2021, 58(11): 1131001

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    Paper Information

    Category: Thin Films

    Received: Sep. 16, 2020

    Accepted: Dec. 2, 2020

    Published Online: Jun. 7, 2021

    The Author Email: Ganghua Bao (bgh@mfoptics.com)

    DOI:10.3788/LOP202158.1131001

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