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Laser & Optoelectronics Progress, Volume. 58, Issue 11, 1131001(2021)

Film Thickness Error in Electron Beam Evaporation with Revolving Structure

Ganghua Bao*, Ben Wang, Yujiang Xie, and Yu Liang
Author Affiliations
  • Shanghai Multiple Films & Laser Tech., Co., Ltd., Shanghai 201306, China
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    Article index updated: Mar. 14, 2025

    The article is cited by 4 article(s) CLP online library. (Some content might be in Chinese.)
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    Ganghua Bao, Ben Wang, Yujiang Xie, Yu Liang. Film Thickness Error in Electron Beam Evaporation with Revolving Structure[J]. Laser & Optoelectronics Progress, 2021, 58(11): 1131001

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    Paper Information

    Category: Thin Films

    Received: Sep. 16, 2020

    Accepted: Dec. 2, 2020

    Published Online: Jun. 7, 2021

    The Author Email: Bao Ganghua (bgh@mfoptics.com)

    DOI:10.3788/LOP202158.1131001

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology