Chinese Journal of Lasers, Volume. 41, Issue 5, 508006(2014)

System Errors Analysis of Grating Lateral Shearing Interferometer

Li Jie1,2、*, Tang Feng1, Wang Xiangzhao1, Dai Fengzhao1, and Feng Peng1
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
  • show less
    References(16)

    [1] [1] Malacara D. Optical Shop Testing[M]. United States: John Wiley & Sons, 2007. 108-111.

    [2] [2] Dai F, Tang F, Wang X, et al.. Modal wavefront reconstruction based on Zernike polynomials for lateral shearing interferometry: comparisons of existing algorithms[J]. Appl Opt, 2012, 51(21): 5028-5037.

    [3] [3] Zhang Chen, Liu Chunling, Li Dahai, et al.. Study of calibration method of radial shearing interfermetry[J]. Acta Optica Sinica, 2013, 33(s1): s112001.

    [4] [4] Donald J Bone, H A Bachor, Sandeman R J. Fringe pattern analysis using 2D Fourier transform[J]. Appl Opt, 1986, 25(10): 1653-1660.

    [5] [5] Roddier F, Roddier C. Wavefront reconstruction using iterative Fourier transforms[J]. Appl Opt, 1991, 30(11): 1325-1327.

    [6] [6] Naulleau P P, Goldberg K A, Bokor J. Extreme ultraviolet carrier-frequency shearing interferometry of a lithographic four-mirror optical system[J]. J Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 2000, 18(6): 2939-2943.

    [7] [7] Miyakawa R H. Wavefront Metrology for High Resolution Optical Systems[D]. Berkeley: University of California, 2011. 44-52.

    [8] [8] Liu Z, Sugisaki K, Ishii M, et al.. Astigmatism measurement by lateral shearing interferometer[J]. J Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 2004, 22(6): 2980-2983.

    [9] [9] Goldberg K A. Extreme Ultraviolet Interferometry[D]. Berkeley: University of California, 1997. 74-84.

    [10] [10] Liu Z, Sugisaki K, Zhu Y, et al.. Double-grating lateral shearing interferometer for extreme ultraviolet lithography[J]. Jpn J Appl Phys, 2004, 43(6): 3718-3721.

    [11] [11] Sugisaki K, Hasegawa M, Okada M, et al.. EUVA′s Challenges Toward 0.1 nm Accuracy in EUV at-Wavelength Interferometry[M]. Berlin: Springer, 2006. 252-266.

    [12] [12] Harbers G, Kunst P, Leibbrandt G. Analysis of lateral shearing interferograms by use of Zernike polynomials[J]. Appl Opt, 1996, 35(31): 6162-6172.

    [13] [13] Rimmer M P, Wyant J C. Evaluation of large aberrations using a lateral-shear interferometer having variable shear[J]. Appl Opt, 1975, 14(1): 142-150.

    [14] [14] Dai F, Tang F, Wang X, et al.. Generalized zonal wavefront reconstruction for high spatial resolution in lateral shearing interferometry[J]. J Opt Soc Am A, 2012, 29(9): 2038-2047.

    [15] [15] Dai F, Tang F, Wang X, et al.. Use of numerical orthogonal transformation for the Zernike analysis of lateral shearing interferograms[J]. Opt Express, 2012, 20(2): 1530-1544.

    [16] [16] Sugisaki K, Okada M, Otaki K, et al.. EUV wavefront measurement of six-mirror optics using EWMS[C]. SPIE, 2008, 6921: 69212U.

    CLP Journals

    [1] Zhao Zixin, Xiao Zhaoxian, Zhang Hangying, Zhao Hong. Self-Interference for Spatial Light Modulator Phase Modulation Characteristics by Liquid Crystal Grating[J]. Laser & Optoelectronics Progress, 2017, 54(6): 61204

    [2] Wu Feibin, Tang Feng, Wang Xiangzhao, Li Jie, Li Sikun. Study on Ronchi Shearing Interferometry for Wave-Front Aberration Measurement of Lithography Projection Lens[J]. Chinese Journal of Lasers, 2015, 42(3): 308008

    [3] Yue Xiumei, Yang Yongying, Ling Tong, Liu Dong, Luo Yandong, Bai Jian, Shen Yibing. Design of Randomly Encoded Hybrid Grating for Wavefront Testing by Quadriwave Lateral Shearing Interferometry[J]. Chinese Journal of Lasers, 2015, 42(10): 1008006

    [4] LIU Zhi-xiang, XING Ting-wen, JIANG Ya-dong, Lü Bao-bin. Measurement of wavefront aberration for high NA objective and some special problems[J]. Optics and Precision Engineering, 2016, 24(3): 482

    [5] Chen Xixi, Wang Daodang, Xu Yangbo, Kong Ming, Guo Tiantai, Zhao Jun, Zhu Baohua. Analysis of Point-Diffraction Wavefront with Sub-Wavelength-Aperture Fiber[J]. Acta Optica Sinica, 2015, 35(9): 912004

    [6] Wu Feibin, Tang Feng, Wang Xiangzhao, Li Jie, Li Yong. Phase Retrieval Errors Analysis of Ronchi Phase-Shifting Shearing Interferometer[J]. Acta Optica Sinica, 2015, 35(6): 612004

    [7] Sun Yuwen, Li Shiguang, Zong Mingcheng. Nanoscale Focusing and Leveling Measurement Technology Based on Optical Spatial Split[J]. Acta Optica Sinica, 2016, 36(5): 512002

    [8] Feng Jinhua, Hu Song, Li Yanli, He Yu. Nano Focusing Method Based on Moire Fringe Phase Analysis[J]. Acta Optica Sinica, 2015, 35(2): 212005

    [9] [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Analysis of Modulation Function in the One-Dimensional Phase Shifting Lateral Shearing Interferometry[J]. Laser & Optoelectronics Progress, 2015, 52(11): 111202

    [10] Miao Yue, Bai Fuzhong, Liu Zhen, Tian Chaoping, Mei Xiuzhuang. A Common-Path Interferometry Applied to Measure Phase Modulation Characteristics of Liquid Crystal Spatial Light Modulator[J]. Laser & Optoelectronics Progress, 2016, 53(2): 21204

    [11] Fang Wei, Tang Feng, Wang Xiangzhao, Zhu Penghui, Li Jie, Meng Zejiang, Zhang Heng. Measurement of Wavefront Aberration of Extreme Ultraviolet Lithographic Projection Lens Based on Ptychography[J]. Acta Optica Sinica, 2016, 36(10): 1012002

    Tools

    Get Citation

    Copy Citation Text

    Li Jie, Tang Feng, Wang Xiangzhao, Dai Fengzhao, Feng Peng. System Errors Analysis of Grating Lateral Shearing Interferometer[J]. Chinese Journal of Lasers, 2014, 41(5): 508006

    Download Citation

    EndNote(RIS)BibTexPlain Text
    Save article for my favorites
    Paper Information

    Category: measurement and metrology

    Received: Nov. 13, 2013

    Accepted: --

    Published Online: Apr. 9, 2014

    The Author Email: Li Jie (ljieleej@siom.ac.cn)

    DOI:10.3788/cjl201441.0508006

    Topics