Researching | Improving accuracy and sensitivity of diffraction-based overlay metrology

Chinese Optics Letters, Volume. 21, Issue 7, 071204(2023)

Improving accuracy and sensitivity of diffraction-based overlay metrology

Wenhe Yang^1,2, Nan Lin^1,2、*, Xin Wei^1,2, Yunyi Chen^1,2, Sikun Li², Yuxin Leng², and Jianda Shao^2、**

Author Affiliations

¹School of Microelectronics, Shanghai University, Shanghai 200072, China

²Department of Precision Optics Engineering, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China

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Wenhe Yang, Nan Lin, Xin Wei, Yunyi Chen, Sikun Li, Yuxin Leng, Jianda Shao, "Improving accuracy and sensitivity of diffraction-based overlay metrology," Chin. Opt. Lett. 21, 071204 (2023)

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Paper Information

Category: Instrumentation, Measurement, and Optical Sensing

Received: Feb. 27, 2023

Accepted: Apr. 18, 2023

Published Online: Jul. 24, 2023

The Author Email: Nan Lin (nanlin@siom.ac.cn), Jianda Shao (jdshao@siom.ac.cn)

DOI:10.3788/COL202321.071204

Topics

laser devices and laser physics

Lasers and Laser Optics

laser manufacturing

Instrumentation, Measurement and Metrology