Fig. 1. Schematic of self-interference.

Fig. 2. Optical path schematic of the offline testing; (a) reflection surface; (b) transmission surface.

Fig. 3. Real-time monitoring system; (a) sideways-facing schematic of the monitoring system, (b) real monitoring system photograph.

Fig. 4. Surface figure of repeatability tests.

Fig. 5. Schematic platform of the relative position of the monitoring plate and workpiece.

Fig. 6. Variation trend of the monitoring plate and workpiece for online and offline testing in terms of PV; (a) self-interference and reflection surface; (b) self-interference and transmission surface.

Fig. 7. Variation trend of the monitoring plate and workpiece for online and offline testing in terms of power; (a) self-interference and reflection surface; (b) self-interference and transmission surface.

Fig. 8. Proportional relationship of online and offline surface in terms of PV.

Fig. 9. Variation of the surface figure in terms of the polishing heat and stress.

Fig. 10. Variation of the surface figure for the horizontal and vertical placement of the workpiece; (a) self-interference and reflection surface; (b) self-interference and transmission surface.

Fig. 11. Proportional relationship of the online and offline surface in terms of PV.