Chinese Journal of Lasers, Volume. 51, Issue 12, 1202407(2024)

Development and Application of Laser Direct Writing Lithography Technology (Invited)

Linsen Chen1,2、*, Wenbin Huang1,2, Donglin Pu1,2, Wen Qiao1,2, Fengbin Zhou1,2, Sui Bowen1,2, and Zhi Meng1,2
Author Affiliations
  • 1College of Optoelectronic Science and Engineering, Soochow University, Suzhou 215006, Jiangsu , China
  • 2Engineering Research Center of Digital Laser Imaging and Display, Ministry of Education, Suzhou 215006, Jiangsu , China
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    References(86)

    [5] Zhu J C, Zhou J K, Shen W M. Design of polarization-independent two-dimensional binary blazed grating[J]. Journal of Infrared and Millimeter Waves, 39, 149-156(2020).

    [17] Amani A M, Tayebi L, Abbasi M et al. The need for smart materials in an expanding smart world: MXene-based wearable electronics and their advantageous applications[J]. ACS Omega, 9, 3123-3142(2023).

    [47] Kim T S, Kim J J, Shin H W. Method for laser interference lithography using diffraction grating[P].

    [52] He M F, Zhu D Z, Wang H Q et al. Advancements in micro-nano optical device based on two-photon direct writing[J]. Acta Optica Sinica, 43, 1623013(2023).

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    Linsen Chen, Wenbin Huang, Donglin Pu, Wen Qiao, Fengbin Zhou, Sui Bowen, Zhi Meng. Development and Application of Laser Direct Writing Lithography Technology (Invited)[J]. Chinese Journal of Lasers, 2024, 51(12): 1202407

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    Paper Information

    Category: Laser Micro-Nano Manufacturing

    Received: Mar. 6, 2024

    Accepted: Apr. 16, 2024

    Published Online: Jun. 18, 2024

    The Author Email: Chen Linsen (lschen@suda.edu.cn)

    DOI:10.3788/CJL240664

    CSTR:32183.14.CJL240664

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