Chinese Journal of Lasers, Volume. 51, Issue 12, 1202407(2024)

Development and Application of Laser Direct Writing Lithography Technology (Invited)

Linsen Chen1,2、*, Wenbin Huang1,2, Donglin Pu1,2, Wen Qiao1,2, Fengbin Zhou1,2, Sui Bowen1,2, and Zhi Meng1,2
Author Affiliations
  • 1College of Optoelectronic Science and Engineering, Soochow University, Suzhou 215006, Jiangsu , China
  • 2Engineering Research Center of Digital Laser Imaging and Display, Ministry of Education, Suzhou 215006, Jiangsu , China
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    Figures & Tables(10)
    Three-dimensional (3D) computational lithography system and algorithm. (a) Distributed collaborative 3D computational lithography system; (b) Fourier transform series expansion and light field superposition 3D lithography algorithm
    Morphology and characteristics of micro-nano structures based on 3D vector computing
    SEM image of 3D microstructures
    Projection screen (a) and 100-inch Fresnel lens (b)
    Scanning lithography system for development of large-area gratings[48]. (a) Schematic of variable period scanning beam interference lithography system; (b)‒(c) images of samples prepared by scanning lithography system developed by MIT
    UV continuous frequency lithography system. (a) Schematic diagram of UV continuous frequency lithography system; (b) schematic diagram of Fourier transform optical system based on phase element modulation[51]; (c) relationship between the change of photolithographic structure period and the axial movement distance of phase element; (d) SEM image of grating structure with accuracy up to 89 nm; (e) SEM image of pixel type variable period and variable orientation nanograting structure; (f) SEM image of circular grating; (g) SEM image of Fresnel zone structure; (h) SEM image of microporous array; (i) SEM image of micro column array
    UV lithography system featuring phase and intensity modulation. (a) Large-area ultraviolet lithography direct writing equipment for micro/nano 3D structures; (b)‒(d) multi-step lithography structure diagrams
    Several patterned polarization photolithography technologies. (a) Polarization holography technology; (b) polarization modulation direct writing technology; (c) SLM digital polarization technology[75]; (d) pulsed polarization photolithography technology[76-77]
    Liquid crystal planar photonic devices based on polarization lithography. (a) Textured pattern of liquid crystal microlens array and its application in fingerprint recognition[75]; (b) the reflective cholesteric liquid crystal lens samples and schematic diagram of its application in augmented reality system[79]; (c) polarized light micrograph of achromatic diffractive lens and its achromatic effect[80]; (d) textured pattern of liquid crystal chiral lens and schematic diagram of its application in polarization imaging[81]
    Liquid crystal polarization grating based on geometric phase. (a) Schematic diagram of molecular arrangement of liquid crystal polarization grating; (b) high-efficiency and high-quality liquid crystal polarization grating[74]; (c) textured patterns of polarization gratings with different periods[74]; (d) schematic diagram of steering design based on liquid crystal polarization grating
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    Linsen Chen, Wenbin Huang, Donglin Pu, Wen Qiao, Fengbin Zhou, Sui Bowen, Zhi Meng. Development and Application of Laser Direct Writing Lithography Technology (Invited)[J]. Chinese Journal of Lasers, 2024, 51(12): 1202407

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    Paper Information

    Category: Laser Micro-Nano Manufacturing

    Received: Mar. 6, 2024

    Accepted: Apr. 16, 2024

    Published Online: Jun. 18, 2024

    The Author Email: Chen Linsen (lschen@suda.edu.cn)

    DOI:10.3788/CJL240664

    CSTR:32183.14.CJL240664

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