Development and Application of Laser Direct Writing Lithography Technology (Invited)

Linsen Chen; Wenbin Huang; Donglin Pu; Wen Qiao; Fengbin Zhou; Sui Bowen; Zhi Meng

doi:10.3788/CJL240664

Chinese Journal of Lasers, Volume. 51, Issue 12, 1202407(2024)

Development and Application of Laser Direct Writing Lithography Technology (Invited)

Linsen Chen^1,2、*, Wenbin Huang^1,2, Donglin Pu^1,2, Wen Qiao^1,2, Fengbin Zhou^1,2, Sui Bowen^1,2, and Zhi Meng^1,2

Author Affiliations

¹College of Optoelectronic Science and Engineering, Soochow University, Suzhou 215006, Jiangsu , China

²Engineering Research Center of Digital Laser Imaging and Display, Ministry of Education, Suzhou 215006, Jiangsu , China

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Linsen Chen, Wenbin Huang, Donglin Pu, Wen Qiao, Fengbin Zhou, Sui Bowen, Zhi Meng. Development and Application of Laser Direct Writing Lithography Technology (Invited)[J]. Chinese Journal of Lasers, 2024, 51(12): 1202407

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Paper Information

Category: Laser Micro-Nano Manufacturing

Received: Mar. 6, 2024

Accepted: Apr. 16, 2024

Published Online: Jun. 18, 2024

The Author Email: Chen Linsen (lschen@suda.edu.cn)

DOI:10.3788/CJL240664

CSTR:32183.14.CJL240664

Topics

laser devices and laser physics

Lasers and Laser Optics

Laser physics

laser manufacturing

Instrumentation, Measurement and Metrology