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Chinese Optics Letters, Volume. 20, Issue 9, 091201(2022)

White light interferometry with spectral-temporal demodulation for large-range thickness measurement

Yunlong Zhu1,2, Zhuoran Li1,2, Xu Lu1,2, Yonggui Yuan1,2、*, and Jun Yang2,3,4、**
Author Affiliations
  • 1Key Laboratory of In-fiber Integrated Optics, Ministry of Education of China, Harbin Engineering University, Harbin 150001, China
  • 2College of Physics and Optoelectronic Engineering, Harbin Engineering University, Harbin 150001, China
  • 3Guangdong Provincial Key Laboratory of Information Photonics Technology (Guangdong University of Technology), Guangzhou 510006, China
  • 4School of Information Engineering, Guangdong University of Technology, Guangzhou 510008, China
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    References (19)
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    Figures & Tables(6)
    Experimental results for a single measurement of 500 nm SiO2 coating. (a) Reflectance spectrum F(k), Fref(k), and Fp(k). (b) Comparison of measured reflectance R(k) and theoretical model. (c) Normalized sum of squared errors for reflectance fitting between the experimental result and theoretical model at different values of input thickness. (d) Detailed view of (c) showing the minimum sum of squared errors.

    Fig. 1. Experimental results for a single measurement of 500 nm SiO2 coating. (a) Reflectance spectrum F(k), Fref(k), and Fp(k). (b) Comparison of measured reflectance R(k) and theoretical model. (c) Normalized sum of squared errors for reflectance fitting between the experimental result and theoretical model at different values of input thickness. (d) Detailed view of (c) showing the minimum sum of squared errors.

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    Experimental results for a single measurement of 68 µm Si film. (a) Reflectance spectrum F(k), Fref(k), and Fp(k). (b) Comparison of measured reflectance R(k) and theoretical model. (c) Normalized sum of squared errors for reflectance fitting between the experimental result and theoretical model at different values of input thickness. (d) Detailed view of (c) showing the minimum sum of squared errors.

    Fig. 2. Experimental results for a single measurement of 68 µm Si film. (a) Reflectance spectrum F(k), Fref(k), and Fp(k). (b) Comparison of measured reflectance R(k) and theoretical model. (c) Normalized sum of squared errors for reflectance fitting between the experimental result and theoretical model at different values of input thickness. (d) Detailed view of (c) showing the minimum sum of squared errors.

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    • Table 1. Measurement Results for 500 nm SiO2 Coating (nm)

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      Table 1. Measurement Results for 500 nm SiO2 Coating (nm)

      Number of MeasurementPoint APoint BPoint CPoint DPoint E
      1st508.18511.34506.86508.84513.53
      2nd508.67511.09505.66508.62512.71
      3rd507.31511.60506.88508.98512.03
      4th507.65511.36506.52508.26512.81
      5th508.00511.53506.03507.23512.07
      Average507.96511.38506.39508.39512.63
      Standard deviation0.520.200.530.700.62

    • Table 2. Measurement Results for 68 µm Si Film Using Envelope Method (nm)

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      Table 2. Measurement Results for 68 µm Si Film Using Envelope Method (nm)

      Number of MeasurementPoint APoint BPoint CPoint DPoint E
      1st68,613.5968,348.3768,394.2168,299.2568,554.65
      2nd68,646.3368,345.0968,364.7468,243.5968,528.46
      3rd68,613.5968,322.1768,387.6668,282.8868,557.92
      4th68,643.0668,341.8268,404.0368,276.3368,535.00
      5th68,597.2268,358.1968,390.9368,295.9868,593.94
      Average68,622.7668,343.1368,388.3168,279.6168,554.00
      Standard deviation2113152226

    • Table 3. Measurement Results for 68 µm Si Film Using the Proposed Method (nm)

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      Table 3. Measurement Results for 68 µm Si Film Using the Proposed Method (nm)

      Number of MeasurementPoint APoint BPoint CPoint DPoint E
      1st68,628.9768,358.9168,387.2368,330.2068,563.33
      2nd68,628.6468,358.9768,387.5868,331.6868,563.89
      3rd68,629.0168,359.568,388.3368,332.7668,564.37
      4th68,628.8068,359.3868,388.3568,332.8668,564.22
      5th68,629.0368,359.5868,388.6868,333.1768,564.56
      Average68,628.8968,359.2768,388.0468,332.1368,564.07
      Standard deviation0.170.310.601.20.48

    • Table 4. Summary of Measurement Uncertainty Components

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      Table 4. Summary of Measurement Uncertainty Components

      Uncertainty ComponentSourceUncertainty Contribution
      u(lH)Measurement results0.31 nm (see Table 1)
      11.63 nm (see Table 2)
      0.54 nm (see Table 3)
      u(lf)Nominal wavelength4.35×10−2 nm
      u(lT)Temperature change6.93×10−7H (for SiO2)
      2.89×10−6H (for Si)
      u(ls)Film installation2×10−9H
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    Yunlong Zhu, Zhuoran Li, Xu Lu, Yonggui Yuan, Jun Yang, "White light interferometry with spectral-temporal demodulation for large-range thickness measurement," Chin. Opt. Lett. 20, 091201 (2022)

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    Paper Information

    Category: Instrumentation, Measurement, and Optical Sensing

    Received: Feb. 2, 2022

    Accepted: May. 17, 2022

    Posted: May. 18, 2022

    Published Online: Jun. 16, 2022

    The Author Email: Yonggui Yuan (yuanyonggui@aliyun.com), Jun Yang (yangj@gdut.edu.cn)

    DOI:10.3788/COL202220.091201

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology