Photonics Research, Volume. 9, Issue 5, 722(2021)
Dry-etched ultrahigh-Q silica microdisk resonators on a silicon chip
Fig. 1. Typical images and atomic force microscope measurement of the ultrahigh-
Fig. 2. Fabrication process flow for the dry-etched wedged silica microdisk resonators. (a) Thermally grown silica layer on a silicon chip and subsequent deposition of an a-Si layer by plasma enhanced chemical vapor deposition (PECVD). (b) Pattern definition by UV lithography. (c) ICP etching to transfer the mask pattern to the silica layer. (d) Photoresist removal. (e)
Fig. 3. Comparison of intrinsic
Fig. 4. Characterization of the ultrahigh-
Fig. 5. Sidebands’ power versus input pump power. The measured threshold is 1.63 mW for the silica microdisk. The inset shows the optical spectrum with the pump power of 1.66 mW.
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Jiaxin Gu, Jie Liu, Ziqi Bai, Han Wang, Xinyu Cheng, Guanyu Li, Menghua Zhang, Xinxin Li, Qi Shi, Min Xiao, Xiaoshun Jiang, "Dry-etched ultrahigh-Q silica microdisk resonators on a silicon chip," Photonics Res. 9, 722 (2021)
Category: Integrated Optics
Received: Oct. 19, 2020
Accepted: Feb. 11, 2021
Published Online: Apr. 26, 2021
The Author Email: Xiaoshun Jiang (jxs@nju.edu.cn)