Preparation of Low-Resistivity GZO Thin Films Using Pulsed Laser Deposition and Investigation of Optoelectronic Properties

Guankong Mo; Jiahui Liu; Zhuoliang Zou; Zimei Tang; Yulun Liu; Huan He; Yuechun Fu; Xiaoming Shen

doi:10.3788/CJL201946.1003001

Chinese Journal of Lasers, Volume. 46, Issue 10, 1003001(2019)

Preparation of Low-Resistivity GZO Thin Films Using Pulsed Laser Deposition and Investigation of Optoelectronic Properties

Guankong Mo, Jiahui Liu, Zhuoliang Zou, Zimei Tang, Yulun Liu, Huan He, Yuechun Fu, and Xiaoming Shen^*

Author Affiliations

School of Resources, Environment and Materials, Guangxi University, Guangxi Key Laboratory of Processing for Non-Ferrous Metals and Featured Materials, Nanning, Guangxi 530004, China

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Guankong Mo, Jiahui Liu, Zhuoliang Zou, Zimei Tang, Yulun Liu, Huan He, Yuechun Fu, Xiaoming Shen. Preparation of Low-Resistivity GZO Thin Films Using Pulsed Laser Deposition and Investigation of Optoelectronic Properties[J]. Chinese Journal of Lasers, 2019, 46(10): 1003001

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Paper Information

Category: materials and thin films

Received: Apr. 15, 2019

Accepted: Jun. 5, 2019

Published Online: Oct. 25, 2019

The Author Email: Shen Xiaoming (docsjh@ gxu.edu.cn)

DOI:10.3788/CJL201946.1003001

Topics

laser devices and laser physics

Lasers and Laser Optics

Laser physics

laser manufacturing

Instrumentation, Measurement and Metrology