Acta Optica Sinica, Volume. 45, Issue 9, 0905001(2025)

Characteristics of Aperture in Angle‑Resolved Scatterometer

Jun Qiu1,2, Yuejing Qi1,2、*, Jing Ma1, Zhiyu Shi1,2, Miao Jiang3, and Jiangliu Shi3
Author Affiliations
  • 1Institute of Microelectronics of the Chinese Academy of Sciences, Beijing 100029, China
  • 2University of Chinese Academy of Sciences, Beijing 100049, China
  • 3Beijing Superstring Academy of Memory Technology, Beijing 100176, China
  • show less
    Figures & Tables(18)
    Schematic diagram of angle-resolved scatterometer
    Flowchart of diffraction signal distribution calculation
    Schematic diagram of positions of incident light and diffraction signal
    Schematic diagram of positions of incident and diffraction light in xoz plane
    Schematic diagram of annular aperture and corresponding optical signal. (a) Shape; (b) convergent light spot; (c) diffraction signal
    Schematic diagram of BMW aperture and corresponding optical signal. (a) Shape; (b) convergent light spot; (c) diffraction signal
    Schematic diagram of arch aperture and corresponding optical signal. (a) Shape; (b) convergent light spot; (c) diffraction signal
    Schematic diagram of overlay label 1. (a) Main view of LOL structure; (b) top view of LOL structure; (c) main view of LOT structure; (d) top view of LOT structure
    Comparison of diffraction efficiency curves with incident light wavelength under different conditions for overlay label 1. (a) LOL structure with TM polarization; (b) LOL structure with TE polarization; (c) LOT structure with TM polarization; (d) LOT structure with TE polarization
    Curves of ηDE of overlay label 1 as a function of wavelength of incident light under different conditions. (a) LOL structure with TM polarization; (b) LOL structure with TE polarization; (c) LOT structure with TM polarization; (d) LOT structure with TE polarization
    Curves of K of overlay label 1 as a function of wavelength of incident light under different conditions. (a) LOL structure with TM polarization; (b) LOL structure with TE polarization; (c) LOT structure with TM polarization; (d) LOT structure with TE polarization
    Curves of ξSS of overlay label 1 as a function of wavelength of incident light under different conditions. (a) LOL structure with TM polarization; (b) LOL structure with TE polarization; (c) LOT structure with TM polarization; (d) LOT structure with TE polarization.
    Schematic diagram of overlay label 2. (a) Main view of LOL structure; (b) top view of LOL structure; (c) main view of LOT structure; (d) top view of LOT structure
    Curves of ηDE of overlay label 2 as a function of wavelength of incident light under different conditions. (a) LOL structure with TM polarization; (b) LOL structure with TE polarization; (c) LOT structure with TM polarization; (d) LOT structure with TE polarization
    Curves of K of overlay label 2 as a function of wavelength of incident light under different conditions. (a) LOL structure with TM polarization; (b) LOL structure with TE polarization; (c) LOT structure with TM polarization; (d) LOT structure with TE polarization
    Curves of ξSS of overlay label 2 as a function of wavelength of incident light under different conditions. (a) LOL structure with TM polarization; (b) LOL structure with TE polarization; (c) LOT structure with TM polarization; (d) LOT structure with TE polarization
    • Table 1. Simulation parameters of overlay measurement system

      View table

      Table 1. Simulation parameters of overlay measurement system

      ParameterValue
      Numerical aperture0.85
      Wavelength range /nm480‒720
      Wavelength change step size /nm10
      PolarizationTM/TE
    • Table 2. r2 of overlay label 1 under different measurement conditions

      View table

      Table 2. r2 of overlay label 1 under different measurement conditions

      Label structurePolarizationr2
      LOLTM0.9912
      LOLTE0.9896
      LOTTM0.9892
      LOTTE0.9855
    Tools

    Get Citation

    Copy Citation Text

    Jun Qiu, Yuejing Qi, Jing Ma, Zhiyu Shi, Miao Jiang, Jiangliu Shi. Characteristics of Aperture in Angle‑Resolved Scatterometer[J]. Acta Optica Sinica, 2025, 45(9): 0905001

    Download Citation

    EndNote(RIS)BibTexPlain Text
    Save article for my favorites
    Paper Information

    Category: Diffraction and Gratings

    Received: Jan. 15, 2025

    Accepted: Mar. 13, 2025

    Published Online: May. 20, 2025

    The Author Email: Yuejing Qi (qiyuejing@ime.ac.cn)

    DOI:10.3788/AOS250503

    CSTR:32393.14.AOS250503

    Topics