Chinese Optics Letters, Volume. 20, Issue 1, 011601(2022)

Post-treatment of 351 nm SiO2 antireflective coatings for high power laser systems prepared by the sol-gel method

Bin Shen1、*, Huai Xiong1、**, Xu Zhang1, Zhiya Chen1, Xiangyang Pang1, Yajing Guo1, Chengjie Liang1,2, and Haiyuan Li1
Author Affiliations
  • 1Key Laboratory of High Power Laser and Physics, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
  • 2Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing 100049, China
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    Bin Shen, Huai Xiong, Xu Zhang, Zhiya Chen, Xiangyang Pang, Yajing Guo, Chengjie Liang, Haiyuan Li, "Post-treatment of 351 nm SiO2 antireflective coatings for high power laser systems prepared by the sol-gel method," Chin. Opt. Lett. 20, 011601 (2022)

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    Paper Information

    Category: Optical Materials

    Received: May. 28, 2021

    Accepted: Aug. 17, 2021

    Published Online: Oct. 8, 2021

    The Author Email: Bin Shen (bingo2011@siom.ac.cn), Huai Xiong (xhuai1998@siom.ac.cn)

    DOI:10.3788/COL202220.011601

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