Post-treatment of 351 nm SiO<sub>2</sub> antireflective coatings for high power laser systems prepared by the sol-gel method

Bin Shen; Huai Xiong; Xu Zhang; Zhiya Chen; Xiangyang Pang; Yajing Guo; Chengjie Liang; Haiyuan Li

doi:10.3788/COL202220.011601

Chinese Optics Letters, Volume. 20, Issue 1, 011601(2022)

Post-treatment of 351 nm SiO₂ antireflective coatings for high power laser systems prepared by the sol-gel method

Bin Shen^1、*, Huai Xiong^1、**, Xu Zhang¹, Zhiya Chen¹, Xiangyang Pang¹, Yajing Guo¹, Chengjie Liang^1,2, and Haiyuan Li¹

Author Affiliations

¹Key Laboratory of High Power Laser and Physics, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China

²Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing 100049, China

show less

Cited By

Article index updated: Feb. 9, 2025

Citation counts are provided from Web of Science. The counts may vary by service, and are reliant on the availability of their data.

The article is cited by 11 article(s) from Web of Science.

The article is cited by 1 article(s) CLP online library. (Some content might be in Chinese.)

Tools

Get Citation

Copy Citation Text

Bin Shen, Huai Xiong, Xu Zhang, Zhiya Chen, Xiangyang Pang, Yajing Guo, Chengjie Liang, Haiyuan Li, "Post-treatment of 351 nm SiO₂ antireflective coatings for high power laser systems prepared by the sol-gel method," Chin. Opt. Lett. 20, 011601 (2022)

Download Citation

EndNote(RIS)BibTex Plain Text

Set citation alerts for article

Save article for my favorites

Paper Information

Category: Optical Materials

Received: May. 28, 2021

Accepted: Aug. 17, 2021

Published Online: Oct. 8, 2021

The Author Email: Bin Shen (bingo2011@siom.ac.cn), Huai Xiong (xhuai1998@siom.ac.cn)

DOI:10.3788/COL202220.011601

Topics

laser devices and laser physics

Lasers and Laser Optics

Laser physics

laser manufacturing

Instrumentation, Measurement and Metrology