Chinese Optics Letters, Volume. 20, Issue 1, 011601(2022)
Post-treatment of 351 nm SiO2 antireflective coatings for high power laser systems prepared by the sol-gel method
Figures & Tables(8)
Fig. 1. Schematic diagram showing post-treatment processes of 3ω AR.
Fig. 2. Optical performance of 3ω AR coatings at different experimental stages: (a) sample 1, (b) sample 2, (c) sample 3, (d) sample 4.
Fig. 4. Defect positions of all samples. (a)–(d) samples 1–4 before 85°C/85 RH treatment, (e)–(h) samples 1–4 after 85°C/85 RH treatment.
Fig. 5. Transmittance spectra before and after contamination: (a) sample 1, (b) sample 2, (c) sample 3, (d) sample 4.
Table 1. Peak Transmittance and Wavelength of 3
ω AR Coatings at Different Experimental StagesView tableView in ArticleTable 1. Peak Transmittance and Wavelength of 3
ω AR Coatings at Different Experimental StagesSample Effect of Heat Treatment Effect of Heat Treatment and Post-Treatment Effect of 85°C/85 RH 1 368 99.58 374 99.55 376 99.28 2 355 99.65 373 99.50 372 99.03 3 366 99.65 369 99.67 388 98.42 4 354 99.67 374 99.46 372 99.25
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Bin Shen, Huai Xiong, Xu Zhang, Zhiya Chen, Xiangyang Pang, Yajing Guo, Chengjie Liang, Haiyuan Li, "Post-treatment of 351 nm SiO2 antireflective coatings for high power laser systems prepared by the sol-gel method," Chin. Opt. Lett. 20, 011601 (2022)
Paper Information
Category: Optical Materials
Received: May. 28, 2021
Accepted: Aug. 17, 2021
Published Online: Oct. 8, 2021
The Author Email: Bin Shen (bingo2011@siom.ac.cn), Huai Xiong (xhuai1998@siom.ac.cn)
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