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Acta Optica Sinica, Volume. 38, Issue 6, 0605001(2018)

Design and Analysis of Scanning Beam Interference Lithography Optical System Based on Far-Field Interference

Sen Lu1,2、*, Kaiming Yang1,2、*, Yu Zhu1,2, Leijie Wang1,2, and Ming Zhang1,2
Author Affiliations
  • 1 State Key Laboratory of Tribology, Department of Mechanical Engineering, Tsinghua University, Beijing 100084, China
  • 2 Beijing Key Laboratory of Precision/Ultra-Precision Manufacturing Equipments and Control, Department of Mechanical Engineering, Tsinghua University, Beijing 100084, China
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    AbstractGet PDF(in Chinese)
    Figures&Tables (16)
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    References (18)
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    Figures & Tables(16)
    Schematic of SBIL system

    Fig. 1. Schematic of SBIL system

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    Relationship between beam waist radius and waist-to-substrate distance

    Fig. 2. Relationship between beam waist radius and waist-to-substrate distance

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    Diagram of single light path design

    Fig. 3. Diagram of single light path design

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    Far-field interference of Gaussian beams

    Fig. 4. Far-field interference of Gaussian beams

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    Wavefront curvature distribution curve of Gaussian beam

    Fig. 5. Wavefront curvature distribution curve of Gaussian beam

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    Nonlinear error distribution of phase without assembly error (unit of error data in curves is nm)

    Fig. 6. Nonlinear error distribution of phase without assembly error (unit of error data in curves is nm)

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    Nonlinear error distribution of phase with waist-to-substrate assembly errors (unit of error data in curves is nm). (a) dR: -1 mm; (b) dR: -20 mm, dL: -20 mm; (c) dR: -21 mm, dL: -20 mm

    Fig. 7. Nonlinear error distribution of phase with waist-to-substrate assembly errors (unit of error data in curves is nm). (a) dR: -1 mm; (b) dR: -20 mm, dL: -20 mm; (c) dR: -21 mm, dL: -20 mm

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    Nonlinear error distribution of phase with waist radius errors (unit of error data in curves is nm)

    Fig. 8. Nonlinear error distribution of phase with waist radius errors (unit of error data in curves is nm)

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    Nonlinear error distribution of phase with two kind of assembly errors (unit of error data in curves is nm)

    Fig. 9. Nonlinear error distribution of phase with two kind of assembly errors (unit of error data in curves is nm)

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    Nonlinear error distribution of phase with worst assembly errors (unit of error data in curves is nm)

    Fig. 10. Nonlinear error distribution of phase with worst assembly errors (unit of error data in curves is nm)

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    Schematic of Gaussian beam through circular aperture

    Fig. 11. Schematic of Gaussian beam through circular aperture

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    Curves of approximate characteristics of Gaussian beam versus aperture radius

    Fig. 12. Curves of approximate characteristics of Gaussian beam versus aperture radius

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    Nonlinear error distribution of phase when ωo=37.05 μm (unit of error data in curves is nm)

    Fig. 13. Nonlinear error distribution of phase when ωo=37.05 μm (unit of error data in curves is nm)

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    Nonlinear error distribution of phase when d=275 mm (unit of error data in curves is nm)

    Fig. 14. Nonlinear error distribution of phase when d=275 mm (unit of error data in curves is nm)

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    • Table 1. Property changes of beams after passing through lens with a focal length of 175 nm

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      Table 1. Property changes of beams after passing through lens with a focal length of 175 nm

      Parameterω' /mmz' /mβ /mradb /m
      Input0.350.7430.651.084
      Output0.050.1874.50.02217

    • Table 2. Nonlinear error analysis results of phase of interference fringe

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      Table 2. Nonlinear error analysis results of phase of interference fringe

      Figure No.Assembly errorMaximumnonlinearerror /nm
      Fig. 6-1.273
      Fig. 7(a)dR: -1 mm2.183
      Fig. 7(b)dR: -20 mm, dL: -20 mm1.398
      Fig. 7(c)dR: -21 mm, dL: -20 mm2.397
      Fig. 8ωoR: -1 μm, ωoL: +1 μm1.436
      Fig. 9dR: -21 mm, dL: -20 mmωoR: -1 μm, ωoL: +1 μm2.585
      Fig. 10ωoR: -1 μm, ωoL: +1 μmθR: -200 μrad, θL: +200 μraddR: -21 mm, dL: -20 mm2.918
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    Sen Lu, Kaiming Yang, Yu Zhu, Leijie Wang, Ming Zhang. Design and Analysis of Scanning Beam Interference Lithography Optical System Based on Far-Field Interference[J]. Acta Optica Sinica, 2018, 38(6): 0605001

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    Paper Information

    Category: Diffraction and Gratings

    Received: --

    Accepted: --

    Published Online: Jul. 9, 2018

    The Author Email:

    DOI:10.3788/AOS201838.0605001

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology