Design and Analysis of Scanning Beam Interference Lithography Optical System Based on Far-Field Interference

Sen Lu; Kaiming Yang; Yu Zhu; Leijie Wang; Ming Zhang

doi:10.3788/AOS201838.0605001

Acta Optica Sinica, Volume. 38, Issue 6, 0605001(2018)

Design and Analysis of Scanning Beam Interference Lithography Optical System Based on Far-Field Interference

Sen Lu^1,2、*, Kaiming Yang^1,2、*, Yu Zhu^1,2, Leijie Wang^1,2, and Ming Zhang^1,2

Author Affiliations

¹ State Key Laboratory of Tribology, Department of Mechanical Engineering, Tsinghua University, Beijing 100084, China

² Beijing Key Laboratory of Precision/Ultra-Precision Manufacturing Equipments and Control, Department of Mechanical Engineering, Tsinghua University, Beijing 100084, China

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Sen Lu, Kaiming Yang, Yu Zhu, Leijie Wang, Ming Zhang. Design and Analysis of Scanning Beam Interference Lithography Optical System Based on Far-Field Interference[J]. Acta Optica Sinica, 2018, 38(6): 0605001

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Paper Information

Category: Diffraction and Gratings

Received: --

Accepted: --

Published Online: Jul. 9, 2018

The Author Email:

DOI:10.3788/AOS201838.0605001

Topics

laser devices and laser physics

Lasers and Laser Optics

Laser physics

laser manufacturing

Instrumentation, Measurement and Metrology