Chinese Optics Letters, Volume. 13, Issue 8, 082201(2015)
Three-step lithography to the fabrication of vertically coupled micro-ring resonators in amorphous silicon-on-insulator
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Fig. 1. Vertically coupled micro-ring resonators. (a) Four-port and (b) two-port configurations.
Fig. 2. Characterization of the material properties. (a) The FTIR spectrum. (b) The IR camera image of loss streak from a 200 nm a-Si:H wafer. (c) The data extracted from this image fitted with a linear decay.
Fig. 5. Optical microscopy picture of the first layer of a two-port ring resonator.
Fig. 6. Scanning electron microscope pictures of straight waveguide, mark, and first layer of four-port racetrack resonator after etching.
Fig. 7. Optical microscopy photograph of windows pattern on bottom marks after development.
Table 1. Hydrogenated Amorphous Silicon Deposition Conditions
View tableView in ArticleTable 1. Hydrogenated Amorphous Silicon Deposition Conditions
T (°C) P (mTorr) (sccm) He (sccm) RF power (W) Deposition rate (nm/min) Refractive index 250 1500 25 475 10 20 3.6
Table 2. Su-8 Coating and Etching Conditions
View tableView in ArticleTable 2. Su-8 Coating and Etching Conditions
Su-8 Coating Spinning rate(r/min) Spinning t(min) Bake T(°C) Bake t(min) UV light t(min) Bake T(°C) Bake t(min) Thick (nm) 2000 0.5 90 1 0.1 90 1 4600 Su-8 Etching Pressure (mTorr) (sccm) Ar (sccm) (sccm) RF power (W) T(°C) Deposited rate(nm/min) 15 30 2 3 10 10 336
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Jun Cheng, Nan Yan, "Three-step lithography to the fabrication of vertically coupled micro-ring resonators in amorphous silicon-on-insulator," Chin. Opt. Lett. 13, 082201 (2015)
Paper Information
Category: Optical Design and Fabrication
Received: Mar. 21, 2015
Accepted: Jun. 8, 2015
Published Online: Sep. 14, 2018
The Author Email: Jun Cheng (2120100260@bit.edu.cn)
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