Acta Optica Sinica, Volume. 44, Issue 16, 1622001(2024)

Removal Uniformity in Ring-Pendulum Double-Sided Polishing Based on Pressure Distribution

Chen Mao1, Bo Xiao2、**, Chunyang Wang3、*, Yifan Bai2, Siling Huang4, and Dasen Wang4
Author Affiliations
  • 1College of Weapon Science and Technology, Xi’an Technological University, Xi’an 710000, Shaanxi, China
  • 2School of Opto-Electronical Engineering, Xi’an Technological University, Xi’an 710000, Shaanxi, China
  • 3Xi’an Key Laboratory of Active Photoelectric Imaging Detection Technology, Xi’an Technological University, Xi’an 710000, Shaanxi, China
  • 4Ningbo Branch of Chinese Academy of Ordnance Science, Ningbo 315103, Zhejiang, China
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    References(17)

    [6] Li Q, Liu Q L, Du Y J et al. Advances in optimization design and application of textured surfaces[J]. China Surface Engineering, 34, 59-73(2021).

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    Chen Mao, Bo Xiao, Chunyang Wang, Yifan Bai, Siling Huang, Dasen Wang. Removal Uniformity in Ring-Pendulum Double-Sided Polishing Based on Pressure Distribution[J]. Acta Optica Sinica, 2024, 44(16): 1622001

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    Paper Information

    Category: Optical Design and Fabrication

    Received: Mar. 6, 2024

    Accepted: Apr. 18, 2024

    Published Online: Jul. 31, 2024

    The Author Email: Bo Xiao (xiaobo@xatu.edu.cn), Chunyang Wang (wangchunyang191@163.com)

    DOI:10.3788/AOS240703

    CSTR:32393.14.AOS240703

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