Chinese Optics Letters, Volume. 18, Issue 8, 083101(2020)

Effects of various substrate materials on structural and optical properties of amorphous silicon nitride thin films deposited by plasma-enhanced chemical vapor deposition

Liangyi Hang*, Weiguo Liu**, and Junqi Xu
Author Affiliations
  • Shaanxi Provincial Key Laboratory of Thin Films Technology and Optical Test, Xi’an Technological University, Xi’an 710021, China
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    Liangyi Hang, Weiguo Liu, Junqi Xu, "Effects of various substrate materials on structural and optical properties of amorphous silicon nitride thin films deposited by plasma-enhanced chemical vapor deposition," Chin. Opt. Lett. 18, 083101 (2020)

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    Paper Information

    Category: Thin Films and Optics at Surfaces

    Received: Apr. 2, 2020

    Accepted: Jun. 10, 2020

    Posted: Jun. 10, 2020

    Published Online: Jul. 14, 2020

    The Author Email: Liangyi Hang (lyhang999@163.com), Weiguo Liu (wgliu@163.com)

    DOI:10.3788/COL202018.083101

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