Chinese Journal of Lasers, Volume. 43, Issue 4, 407001(2016)

Design and Fabrication of Broadband Mo/Si Multilayer Films for Extreme Ultra Violet Lithography Illumination System

Yu Bo1,2、*, Li Chun1, Jin Chunshui1, and Wang Chunzhong3
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
  • 3[in Chinese]
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    [7] [7] Kuhlmann T, Yulin S, Feigl T, et al.. Design and fabrication of broadband EUV multilayer mirrors[C]. SPIE, 2002, 4688: 509-515.

    [8] [8] Yakshin A E, Kozhevnikov I V, Zoethout E, et al.. Properties of broadband depth-graded multilayer mirrors for EUV optical systems[J]. Opt Express, 2010, 18(7): 6957-6971.

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    [11] [11] Yu B, Jin C S, Yao S, et al.. Control of lateral thickness gradients of Mo–Si multilayer on curved substrates using genetic algorithm[J]. Opt Lett, 2015, 40(17): 3958-3961.

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    CLP Journals

    [1] Zhang Chao, Zhang Jierui, Wang Yiming, Kuang Shangqi, Xie Yao. Design of Broad-Angle Extreme Ultraviolet Multilayer Coatings Based on Quantum Evolutionary Algorithm[J]. Acta Optica Sinica, 2017, 37(6): 631001

    [2] Wang Yi, Lu Qipeng, Gao Yunguo. Impact of Carbon Contamination Cleaning Technologies on Reflectivity of Extreme Ultraviolet Lithography Optics[J]. Chinese Journal of Lasers, 2017, 44(3): 303004

    [3] KUANG Shang-qi, ZHANG Chao, WANG Yi-ming, ZHOU Xiang-yan, XIE Yao. Application of improved quantum evolutionary algorithm in design of broadband EUV multilayer[J]. Optics and Precision Engineering, 2017, 25(8): 2046

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    Yu Bo, Li Chun, Jin Chunshui, Wang Chunzhong. Design and Fabrication of Broadband Mo/Si Multilayer Films for Extreme Ultra Violet Lithography Illumination System[J]. Chinese Journal of Lasers, 2016, 43(4): 407001

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    Paper Information

    Category: materials and thin films

    Received: Sep. 29, 2015

    Accepted: --

    Published Online: Mar. 29, 2016

    The Author Email: Bo Yu (yubodisan@126.com)

    DOI:10.3788/cjl201643.0407001

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