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Chinese Journal of Lasers, Volume. 43, Issue 4, 407001(2016)

Design and Fabrication of Broadband Mo/Si Multilayer Films for Extreme Ultra Violet Lithography Illumination System

Yu Bo1,2、*, Li Chun1, Jin Chunshui1, and Wang Chunzhong3
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  • 1[in Chinese]
  • 2[in Chinese]
  • 3[in Chinese]
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    Article index updated: Mar. 10, 2025

    The article is cited by 6 article(s) CLP online library. (Some content might be in Chinese.)
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    Yu Bo, Li Chun, Jin Chunshui, Wang Chunzhong. Design and Fabrication of Broadband Mo/Si Multilayer Films for Extreme Ultra Violet Lithography Illumination System[J]. Chinese Journal of Lasers, 2016, 43(4): 407001

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    Paper Information

    Category: materials and thin films

    Received: Sep. 29, 2015

    Accepted: --

    Published Online: Mar. 29, 2016

    The Author Email: Bo Yu (yubodisan@126.com)

    DOI:10.3788/cjl201643.0407001

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology