Chinese Journal of Lasers, Volume. 43, Issue 4, 407001(2016)
Design and Fabrication of Broadband Mo/Si Multilayer Films for Extreme Ultra Violet Lithography Illumination System
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Yu Bo, Li Chun, Jin Chunshui, Wang Chunzhong. Design and Fabrication of Broadband Mo/Si Multilayer Films for Extreme Ultra Violet Lithography Illumination System[J]. Chinese Journal of Lasers, 2016, 43(4): 407001
Paper Information
Category: materials and thin films
Received: Sep. 29, 2015
Accepted: --
Published Online: Mar. 29, 2016
The Author Email: Bo Yu (yubodisan@126.com)
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