To realize the application of a metal grating polarizer in a polarization illumination system for photolithography, a dielectric-metal grating polarizer based on the inverse polarization effect of a resonant-domain grating is proposed. The grating comprises aluminum (Al), magnesium fluoride (MgF2), and a silicon dioxide (SiO2) substrate. In comparison with general sub-wavelength metallic gratings, the period of the proposed polarizer is close to the wavelength of the incident light (0.19--0.20 μm), and it exhibits the inverse polarization effect of transmitting transverse electric (TE) polarized light and reflecting transverse magnetic (TM) polarized light. Finite difference time domain (FDTD) simulation results indicate that the transmittance of TE-polarized light exceeds 60% and the polarization extinction ratio is greater than 180 when light having a wavelength of 0.193 μm is incident normally. In comparison with a single-layer metal grating polarizer constructed using the same materials and structural parameters, the proposed dielectric-metal grating polarizer exhibits better polarization performance in the deep ultraviolet band, with the transmittance and extinction ratio approximately increased by 10% and 4.5 times at wavelength of 0.193 μm, respectively.