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Photonics Research, Volume. 12, Issue 12, 2757(2024)

Illumination diversity in multiwavelength extreme ultraviolet ptychography

Antonios Pelekanidis1,2、†, Fengling Zhang1,2、†, Matthias Gouder1, Jacob Seifert1,2, Mengqi Du1, Kjeld S. E. Eikema1,2, and Stefan Witte1,2、*
Author Affiliations
  • 1Advanced Research Center for Nanolithography, 1098 XG Amsterdam, The Netherlands
  • 2Department of Physics and Astronomy, Vrije Universiteit, 1081 HV Amsterdam, The Netherlands
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    Antonios Pelekanidis, Fengling Zhang, Matthias Gouder, Jacob Seifert, Mengqi Du, Kjeld S. E. Eikema, Stefan Witte, "Illumination diversity in multiwavelength extreme ultraviolet ptychography," Photonics Res. 12, 2757 (2024)

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    Paper Information

    Category: Imaging Systems, Microscopy, and Displays

    Received: Jun. 27, 2024

    Accepted: Sep. 10, 2024

    Published Online: Nov. 12, 2024

    The Author Email: Stefan Witte (witte@arcnl.nl)

    DOI:10.1364/PRJ.533983

    CSTR:32188.14.PRJ.533983

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology