Laser & Optoelectronics Progress, Volume. 56, Issue 23, 231202(2019)
Analysis and Verification of Position Error of Reticle Stage Based on Planar Grating
[1] Zhang X, Liu H B, Gu W et al[J]. A survey on the development of global lithography machines and the localization of lithography equipment Wireless Internet Technology, 2018, 110-111, 118.
[2] Wu T T. Development and experimental study of a multi-degree-of-freedom simultaneous measurement system for two-dimensional stage[D]. Anhui: Hefei University of Technology, 20-28(2018).
[3] Liu C H, Jywe W Y, Hsu C C et al. Development of a laser-based high-precision six-degrees-of-freedom motion errors measuring system for linear stage[J]. Review of Scientific Instruments, 76, 055110(2005).
[4] Zhang Z P, Menq C H. Laser interferometric system for six-axis motion measurement[J]. Review of Scientific Instruments, 78, 083107(2007).
[5] Mao S. Key technologies study of dynamic displacement calibration for high speed heterodyne laser interferometer based on the same measurement trajectory[D]. Harbin: Harbin Institute of Technology, 56-82(2017).
[6] Chi F, Zhu Y, Zhang Z P et al. Environment compensation technologies in dual-frequency laser interferometer measurement system[J]. Chinese Journal of Lasers, 41, 0408004(2014).
[7] Huang M H, Wang H, Chen X et al[J]. Research on the error compensation system of linear encoder's measuring precision Modular Machine Tool & Automatic Manufacturing Technique, 2017, 81-84.
[8] Wu Y F. Design and research on heterodyne planer grating encoder with nanometer resolution[D]. Chengdu: University of Electronic Science and Technology of China, 42-63(2015).
[9] Shang P, Xia H J, Fei Y T. Research status and developing trends of diffraction grating interferometer measurement system[J]. Optical Technique, 37, 313-316(2011).
[10] Wang J. Research on 3-DOF grating interference measurement model of mask table[D]. Harbin: Harbin Institute of Technology, 40-59(2017).
[11] Chen J B. Design and experimental study of ultra-precision displacement measurement for grating interferometer positioning system based on stripe phase shift[D]. Shanghai: Shanghai Jiao Tong University, 61-82(2015).
[12] Dang B S, Xiong X M, Wang X Y et al. Ultra-precision encoder system for displacement measurement[J]. Laser Journal, 39, 42-46(2018).
[13] Cheng J S. Study on interferometer measurement error model in wafer stage[D]. Wuhan: Huazhong University of Science and Technology, 30-45(2008).
[14] Teng W, Zhou Y F, Mu H H et al. An algorithm on laser measurement model of ultra-precision motion stage and error compensation[J]. China Mechanical Engineering, 20, 1492-1497(2009).
[15] Li S W, Luo K, Wang Y C et al. Voltage calibration coefficients extracting based on the least squares method[J]. Journal of Detection & Control, 39, 16-20(2017).
[16] Zhang W Y, Song J. The principle of stepper wafer stage positioning based on the dual-frequency laser interferometer and fault diagnosis[J]. Equipment for Electronic Products Manufacturing, 45, 27-30(2016).
[17] Zhang W T, Du H, Xiong X M et al. Hardware-in-the-loop simulation of high precision displacement measurement system[J]. Chinese Journal of Lasers, 46, 0204001(2019).
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Chunxiao Hao, Wentao Zhang, Xianying Wang, Xunzhi Huang. Analysis and Verification of Position Error of Reticle Stage Based on Planar Grating[J]. Laser & Optoelectronics Progress, 2019, 56(23): 231202
Category: Instrumentation, Measurement and Metrology
Received: Mar. 26, 2019
Accepted: Jun. 24, 2019
Published Online: Nov. 27, 2019
The Author Email: Hao Chunxiao (glietzwt@163.com)