Journal of Semiconductors, Volume. 45, Issue 12, 122102(2024)

Growth, characterization, and transport calculation of Ge/SiGe heterojunction: strategy for the growth of undoped Ge quantum wells

Yiwen Zhang, Jun Deng, Zonghu Li, Xinyou Liu, Haiou Li, Baochuan Wang, Jun Luo, Zhenzhen Kong*, Gang Cao, Guoping Guo, Chao Zhao, and Guilei Wang**
Author Affiliations
  • Laboratory of Fabrication Technologies for Integrated Circuits, Chinese Academy of Sciences, Beijing 100029, China
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    References(43)

    [1] Y Liu, J X Xiong, Z Wang et al. Electric dipole spin resonance induced by hole k-linear Rashba effect in planar Ge(2021).

    [2] C Zhao, X Wang, W Wang. High-κ dielectric and metal gate. CMOS Past, Present and Future. Amsterdam: Elsevier, 69(2018).

    [24] O Newell. Fractional quantum phenomena of 2DHGs within strained germanium quantum well heterostructures(2018).

    [38] R Winkler, S J Papadakis, E P Poortere et al. Spin-orbit coupling in two-dimensional electron and hole systems. Advances in Solid State Physics, 41, 211(2007).

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    Yiwen Zhang, Jun Deng, Zonghu Li, Xinyou Liu, Haiou Li, Baochuan Wang, Jun Luo, Zhenzhen Kong, Gang Cao, Guoping Guo, Chao Zhao, Guilei Wang. Growth, characterization, and transport calculation of Ge/SiGe heterojunction: strategy for the growth of undoped Ge quantum wells[J]. Journal of Semiconductors, 2024, 45(12): 122102

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    Paper Information

    Category: Research Articles

    Received: Aug. 23, 2024

    Accepted: --

    Published Online: Jan. 15, 2025

    The Author Email: Zhenzhen Kong (ZZKong), Guilei Wang (GLWang)

    DOI:10.1088/1674-4926/24080034

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