[1] [1] Chow R, Falabella S, Loomis G E, et al. Reactive evaporation of low-defect density hafnia[J]. Applied Optics, 1993, 32:5567-5574.

[2] [2] Khoshman J M, Khan A, Kordesch M E. Amorphous hafnium oxide thin films for antireflection optical coatings[J]. Surface & Coatings Technology, 2008, 202: 2500-2502.

[3] [3] Cheng Xinbin, Zhang Jinlong, Ding Tao, et al. The effect of an electric field on the thermomechanical damage of nodular defects in dielectric multilayer coatings irradiated by nanosecond laser pulses[J]. Light: Science & Applications, 2013, 2: 80.

[4] [4] Hao Peng, Zhang Shuyu, Li Jianming, et al. Interlays design and its adhesion between ZnS and diamond protective coating[J]. Infrared and Laser Engineering, 2008, 37(2): 347-351. (in Chinese)

[5] [5] Bu Yikun, Zhao Li, Zheng Quan, et al. Design method of high damage threshold laser mirror[J]. Infrared and Laser Engineering, 2006, 35(2): 183-186. (in Chinese)

[6] [6] Roland Thielsch, Torsten Feigi, Norbert Kaiser, et al. Comparison of the optical properties and UV radiation resistance of HfO2 single layers deposited by reactive evaporation, lAD, and PIAD[C]//SPIE, 2000, 3902: 182-193.

[7] [7] Borgogno J P, Lazarides B, Pelletier E. Automatic deter-mination of the optical constants of inhomogeneous thin films[J]. Applied Optics, 1982, 21: 4020-4029.

[8] [8] Tikhonravov A V, Trubetskov M K, Sullivan Brian T, et al. Influence of small inhomogeneities on the spectral characteristics of single thin films[J]. Applied Optics, 1997, 36: 7188-7198.

[9] [9] Han Jin, Zhang Jinlong, Cheng Xinbin, et al. Analysis of the half-wave hole for symmetricalharmonic beam splitter based on equivalent layer theoretics[J]. Acta Optica Sinica, 2012, 32(1): 013100-1-6. (in Chinese)

[10] [10] Lehan J P, Mao Y, Bovard B G, et al. Optical and microstructural properties of hafnium dioxide thin films[J]. Thin Solid Films, 1991, 203: 227-250.

[11] [11] Zhang Dawei, Zhan Meiqiong, Gao Weidong, et al. Preparation of homogenous ZrO2 films[C]//SPIE, 2009, 5623: 215-218.

[12] [12] Jiao Hongfei, Cheng Xinbin, Lu Jiangtao, et al. Effects of substrate temperatures on the structure and properties of hafnium dioxide films [J]. Applied Optics, 2011, 50: C309-C315.

[13] [13] G Parjadis de Lariviere, J M Frigerio, J Rivory, et al. Estimate of the degree of inhomogeneity of the refractive index of dielectric films from spectroscopic ellipsometry[J].Applied Optics, 1992, 31(28): 6056-6061.

[14] [14] OptiLayer Thin Film software.[EB/OL].[2013-12-07] http://www.optilayer.com.

[15] [15] Khoshman J, Kordesch M. Optical properties of a-HfO2 thin films[J]. Surface & Coatings Technology, 2006, 201(6):3530-3535.

[16] [16] Mikko Ritala, Markku Leskela, Lauri Niinisto, et al. Development of crystallinity and morphology in hafnium dioxide thin films grown by atomic layer epitaxy[J]. Thin Solid Films, 1994, 250:72-80

[17] [17] Ho M Y, Gong H, Wilk G D, et al. Morphology and crystallization kinetics in HfO2 thin films grown by atomic layer deposition[J]. Journal of Applied Phpsics, 2003, 93: 1477-1481.

[18] [18] Liu Wei, Su Xiaoping, Zhang Shuyu, et al. Growth and characterization of HfO2 thin films[J]. Chinese Journal of Vacuum Science and Technology, 2008, 28: 159-163. (in Chinese)

[19] [19] Harris M, Macleod H A, Ogura S, et al. The relationship between optical inhomogeneity and film structure[J]. Thin Solid Films, 1979, 57: 173.

[20] [20] Leger J M, Atoouf A, Tomaszewski P E, et al. Pressure-induced phase transitions and volume changes in HfO2 up to 50 GPa [J]. Physical Review B, 1993, 48: 93-98.