Controlling Edge Placement Error in Extreme Ultraviolet Lithography

Jing Cao; Wenhe Yang; Zexu Liu; Yunyi Chen; Xin Wei; Nan Lin

doi:10.3788/CJL231470

Chinese Journal of Lasers, Volume. 51, Issue 7, 0701005(2024)

Controlling Edge Placement Error in Extreme Ultraviolet Lithography

Jing Cao^1,2, Wenhe Yang^1,2, Zexu Liu^1,2, Yunyi Chen^1,2, Xin Wei^1,2, and Nan Lin^1,2、*

¹State Key Laboratory of High Field Laser Physics, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China

²Key Laboratory of Ultra-Intense Laser Science and Technology (CAS), Shanghai 201800, China

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Jing Cao, Wenhe Yang, Zexu Liu, Yunyi Chen, Xin Wei, Nan Lin. Controlling Edge Placement Error in Extreme Ultraviolet Lithography[J]. Chinese Journal of Lasers, 2024, 51(7): 0701005

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Paper Information

Category: laser devices and laser physics

Received: Dec. 1, 2023

Accepted: Jan. 8, 2024

Published Online: Mar. 22, 2024

The Author Email: Lin Nan (nanlin@siom.ac.cn)

DOI:10.3788/CJL231470

CSTR:32183.14.CJL231470

Topics

laser devices and laser physics

Lasers and Laser Optics

Laser physics

laser manufacturing

Instrumentation, Measurement and Metrology