Correction Technology for Illumination Field Intensity Profile in Photolithography Machine

Xiaozhe Ma; Fang Zhang; Huijie Huang

doi:10.3788/CJL202148.2005001

Chinese Journal of Lasers, Volume. 48, Issue 20, 2005001(2021)

Correction Technology for Illumination Field Intensity Profile in Photolithography Machine

Xiaozhe Ma^1,2, Fang Zhang^1、*, and Huijie Huang^1,2、**

¹Laboratory of Information Optics and Optoelectronic Technology, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China

²Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing 100049, China

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Figures & Tables(18)

Fig. 1. Optical system structure of step-and-scan lithography^[11-16]

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Fig. 2. Spatial distribution of top-Gaussian illumination field

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Fig. 3. Generation principle of top-Gaussian illumination field

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Fig. 4. In traditional illumination mode, the spot intensity distribution formed by a field point of view of the illumination light field on the light field correction plate. (a) Size of defocusing spot formation on the field correction plate; (b) intensity distribution of the defocusing spot on the field correction plate

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Fig. 5. Simulation model of optical system for generating the top-Gaussian illumination field

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Fig. 6. Illumination light field of three traditional lighting modes. (a) Illumination field 1; (b) illumination field 2; (c) illumination field 3

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Fig. 7. Flow chart of transmittance distribution optimization algorithm of light field correction plate based on simulated annealing

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Fig. 8. Tendency of E_lost for three illumination fields during optimization. (a) Illumination field 1; (b) illumination field 2; (c) illumination field 3

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Fig. 9. Transmittance distributions of three optimized correctors. (a) Corrector 1; (b) corrector 2; (c) corrector 3

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Fig. 10. Comparison of the three illumination field intensity in non-scan and scan directions before and after correction. (a) Illumination field 1; (b) illumination field 2; (c) illumination field 3

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Fig. 11. Simulation results of three corrected illumination fields. (a) Illumination field 1; (b) illumination field 2; (c) illumination field 3

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Table 1. Requirements of the top-Gaussian illumination field
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Table 1. Requirements of the top-Gaussian illumination field
Non-scan direction Scan direction
D_X/mm D_uni/% D_Y_{_}₉₇ /mm D_Y_{_}₅₀ /mm D_Y_{_}₀₀₃ /mm D_Y_{_}₂₅_~₇₅ /mm
≥104 ≤0.30 4.2±0.5 13.2±0.4 22±1.5 >2.9

Table 2. Design results of the microlenses of MLAs and diffuser

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Table 2. Design results of the microlenses of MLAs and diffuser

Element		Surface No.	Surface type	Radius /mm	Conic	Thickness /mm	Material	Comment
MLAs	1st MLA	1	Sphere	1.60		2.00	Fused silica	Y MLA
	1st MLA	2	Sphere	-2.25		2.00	Fused silica	X MLA
	2nd MLA	3	Aspheric	0.50	-0.39	0.75	Fused silica	X MLA
	2nd MLA	4	Sphere	-1.48		0.75	Fused silica	Y MLA
Diffuser		1	Sphere	inf		2.00	Fused silica
Diffuser		2	Aspheric	-0.70	-2.78	2.00	Fused silica	Y MLA

Table 3. Pitch distributions of the microlenses of MLAs and diffuser

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Table 3. Pitch distributions of the microlenses of MLAs and diffuser

No.	Microlens’ pitch in non-scan direction /mm	Microlens’ pitch in scan direction /mm
MLAs 1	0.52	0.19
MLAs 2	0.52	0.1914	0.1915	0.1916	0.1917	0.1918
MLAs 2	0.52	0.1926	0.1934	0.1941	0.1949	0.1957
MLAs 3	0.52	0.1959	0.1965	0.1968	0.1971	0.1975
MLAs 3	0.52	0.1982	0.1990	0.1998	0.2006	0.2014
Diffuser		0.0090	0.0190	0.0255	0.0320	0.0370
Diffuser		0.0437	0.0500	0.0575	0.0678	0.8195

Table 4. Parameters of illumination light field of three traditional lighting modes

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Table 4. Parameters of illumination light field of three traditional lighting modes

No.	Non-scan direction		Scan direction
No.	D_X /mm	D_uni /%	D_Y_{_}₉₇ /mm	D_Y_{_}₅₀ /mm	D_Y_{_}₀₀₃ /mm	D_Y_{_}₂₅_~₇₅ /mm
Illumination field 1	107.60	1.44	3.79	13.18	27.86	3.69
Illumination field 2	107.55	1.44	4.14	13.68	27.96	3.69
Illumination field 3	107.55	1.44	4.39	14.08	27.96	3.72

Table 5. Parameters and energy loss of the three corrected illumination fields (correction results in non-scan direction)

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Table 5. Parameters and energy loss of the three corrected illumination fields (correction results in non-scan direction)

No.	E_lost /%	Non-scan direction		Scan direction				Time-consuming of optimization /s
No.	E_lost /%	D_X /mm	D_uni /%	D_{Y_}₉₇ /mm	D_{Y_}₅₀ /mm	D_{Y_}₀₀₃ /mm	D_{Y_}₂₅_~₇₅ /mm	Time-consuming of optimization /s
Illumination field 1	1.87	104.06	0.24	3.79	13.18	27.86	3.64	7.68
Illumination field 2	1.92	104.01	0.15	4.14	13.68	27.96	3.64	7.34
Illumination field 3	1.88	104.06	0.17	4.39	14.08	27.96	3.67	7.61

Table 6. Parameters and energy loss of the three corrected illumination fields (final corrected results)

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Table 6. Parameters and energy loss of the three corrected illumination fields (final corrected results)

No.	E_lost /%	Non-scan direction		Scan direction				Total time-consuming of optimization /s
No.	E_lost /%	D_X /mm	D_uni /%	D_{Y_}₉₇ /mm	D_{Y_}₅₀ /mm	D_{Y_}₀₀₃ /mm	D_{Y_}₂₅_~₇₅ /mm	Total time-consuming of optimization /s
Illumination field 1	4.88	104.06	0.26	3.79	13.18	23.46	3.37	9.15
Illumination field 2	6.45	104.01	0.19	4.14	13.48	23.46	3.15	8.87
Illumination field 3	7.78	104.06	0.22	4.39	13.58	23.46	3.00	9.09

Table 7. Parameters and energy loss of the three corrected lighting fields (simulation results)

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Table 7. Parameters and energy loss of the three corrected lighting fields (simulation results)

No.	E_lost /%	Non-scan direction		Scan direction				Time-consuming of simulation /h
No.	E_lost /%	D_X /mm	D_uni /%	D_{Y_}₉₇ /mm	D_{Y_}₅₀ /mm	D_{Y_}₀₀₃ /mm	D_{Y_}₂₅_~₇₅ /mm	Time-consuming of simulation /h
Illumination field 1	4.76	104.06	0.29	3.79	13.18	23.36	3.44	4
Illumination field 2	6.34	104.01	0.22	4.14	13.48	23.36	3.24	4
Illumination field 3	7.67	104.06	0.25	4.39	13.58	23.36	3.05	4

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Xiaozhe Ma, Fang Zhang, Huijie Huang. Correction Technology for Illumination Field Intensity Profile in Photolithography Machine[J]. Chinese Journal of Lasers, 2021, 48(20): 2005001

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Paper Information

Category: Beam transmission and control

Received: Feb. 8, 2021

Accepted: Mar. 18, 2021

Published Online: Sep. 22, 2021

The Author Email: Zhang Fang (zhangfang@siom.ac.cn), Huang Huijie (huanghuijie@siom.ac.cn)

DOI:10.3788/CJL202148.2005001

Topics

laser devices and laser physics

Lasers and Laser Optics

Laser physics

laser manufacturing

Instrumentation, Measurement and Metrology

Table 1. Requirements of the top-Gaussian illumination field

Table 1. Requirements of the top-Gaussian illumination field

Table 2. Design results of the microlenses of MLAs and diffuser

Table 2. Design results of the microlenses of MLAs and diffuser

Table 3. Pitch distributions of the microlenses of MLAs and diffuser

Table 3. Pitch distributions of the microlenses of MLAs and diffuser

Table 4. Parameters of illumination light field of three traditional lighting modes

Table 4. Parameters of illumination light field of three traditional lighting modes

Table 5. Parameters and energy loss of the three corrected illumination fields (correction results in non-scan direction)

Table 5. Parameters and energy loss of the three corrected illumination fields (correction results in non-scan direction)

Table 6. Parameters and energy loss of the three corrected illumination fields (final corrected results)

Table 6. Parameters and energy loss of the three corrected illumination fields (final corrected results)

Table 7. Parameters and energy loss of the three corrected lighting fields (simulation results)

Table 7. Parameters and energy loss of the three corrected lighting fields (simulation results)