Correction Technology for Illumination Field Intensity Profile in Photolithography Machine

Xiaozhe Ma; Fang Zhang; Huijie Huang

doi:10.3788/CJL202148.2005001

Chinese Journal of Lasers, Volume. 48, Issue 20, 2005001(2021)

Correction Technology for Illumination Field Intensity Profile in Photolithography Machine

Xiaozhe Ma^1,2, Fang Zhang^1、*, and Huijie Huang^1,2、**

¹Laboratory of Information Optics and Optoelectronic Technology, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China

²Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing 100049, China

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Xiaozhe Ma, Fang Zhang, Huijie Huang. Correction Technology for Illumination Field Intensity Profile in Photolithography Machine[J]. Chinese Journal of Lasers, 2021, 48(20): 2005001

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Paper Information

Category: Beam transmission and control

Received: Feb. 8, 2021

Accepted: Mar. 18, 2021

Published Online: Sep. 22, 2021

The Author Email: Zhang Fang (zhangfang@siom.ac.cn), Huang Huijie (huanghuijie@siom.ac.cn)

DOI:10.3788/CJL202148.2005001

Topics

laser devices and laser physics

Lasers and Laser Optics

Laser physics

laser manufacturing

Instrumentation, Measurement and Metrology