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Chinese Journal of Lasers, Volume. 51, Issue 18, 1801002(2024)

Research Progress and Prospects of Extreme Ultraviolet Photoresists

Huifang Zhao, Zuohu Zhou, and Lei Zhang*
Author Affiliations
  • Institute of Modern Optics, Nankai University, Tianjin 300350, China
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    Article index updated: Sep. 7, 2025

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    Huifang Zhao, Zuohu Zhou, Lei Zhang. Research Progress and Prospects of Extreme Ultraviolet Photoresists[J]. Chinese Journal of Lasers, 2024, 51(18): 1801002

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    Paper Information

    Category: laser devices and laser physics

    Received: Jul. 11, 2024

    Accepted: Aug. 6, 2024

    Published Online: Sep. 9, 2024

    The Author Email: Lei Zhang (zhanglei3915@nankai.edu.cn)

    DOI:10.3788/CJL241047

    CSTR:32183.14.CJL241047

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology