[1] [1] Zhou Y, Wu G S, Dai W, et al. Accurate determination of optical constants and thickness of absorbing thin films by a combined ellipsometry and spectrophotometry approach[J]. Acta Physica Sinica, 2010, 59(4): 2356–2363.

[2] [2] Song G Z. Broadband Spectroscopy Ellipsometry and its application & research in Integrated Circuits[D]. Chengdu: University of Electronic Science and Technology of China, 2014.

[3] [3] Chen C, An I, Collins R W. Multichannel Mueller matrix ellipsometry for simultaneous real-time measurement of bulk isotropic and surface anisotropic complex dielectric functions of semiconductors[J]. Physical Review Letters, 2003, 90(21): 217402.

[4] [4] Berrier A, Gompf B, Fu L W, et al. Optical anisotropies of single-meander plasmonic metasurfaces analyzed by Mueller matrix spectroscopy[J]. Physical Review B, 2014, 89(19): 195434.

[5] [5] Arwin H. Application of ellipsometry techniques to biological materials[J]. Thin Solid Films, 2011, 519(9): 2589–2592.

[6] [6] Fujiwara H. Spectroscopic Ellipsometry: Principles and Applications[M]. Hoboken: Wiley, 2007.

[7] [7] Li S F. Jones-matrix analysis with Pauli matrices: application to ellipsometry[J]. Journal of the Optical Society of America A, 2000, 17(5): 920–926.

[8] [8] Gu H G, Liu S Y, Chen X G, et al. Calibration of misalignment errors in composite waveplates using Mueller matrix ellipsometry[J]. Applied Optics, 2015, 54(4): 684–693.

[9] [9] Li W Q, Zhang C W, Jiang H, et al. Depolarization artifacts in dual rotating-compensator Mueller matrix ellipsometry[J]. Journal of Optics, 2016, 18(5): 055701.

[10] [10] Fan Z T, Tang Y Y, Wei K, et al. Calibration of focusing lens artifacts in a dual rotating-compensator Mueller matrix ellipsometer[J]. Applied Optics, 2018, 57(15): 4145–4152.

[11] [11] Li J J, Sun X B, Kang Q, et al. Polarization detection accuracy analysis of spectropolarimeter[J]. Infrared and Laser Engineering, 2018, 47(1): 0123002.

[12] [12] Wang H B, Hu X Q, Zhang L, et al. Polarization correction for grating dispersive imaging spectrometer[J]. Acta Optica Sinica, 2016, 36(8): 0812004.

[13] [13] Collins R W, Koh J. Dual rotating-compensator multichannel ellipsometer: instrument design for real-time Mueller matrix spectroscopy of surfaces and films[J]. Journal of the Optical Society of America A, 1999, 16(8): 1997–2006.

[14] [14] Lee J, Koh J, Collins R W. Dual rotating-compensator multichannel ellipsometer: Instrument development for high-speed Mueller matrix spectroscopy of surfaces and thin films[J]. Review of Scientific Instruments, 2001, 72(3): 1742–1754.

[15] [15] Hauge P S, Muller R H, Smith C G. Conventions and formulas for using the Mueller-Stokes calculus in ellipsometry[J]. Surface Science, 1980, 96(1–3): 81–107.

[16] [16] Yao B X, Rao C H, Gu N T. Polarization calibration unit design of 1.8 m Chinese large solar telescope[J]. Opto-Electronic Engineering, 2018, 45(11): 180058.

[17] [17] Song G Z, Liu T, Chen Y Q, et al. Calibration of spectroscopic ellipsometer using multiple standard samples[J]. Acta Optica Sinica, 2014, 34(3): 0312003.