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Chinese Journal of Lasers, Volume. 14, Issue 10, 614(1987)

Threshold and change characteristics of photolithographical rate in laser-induced gas-phase thermochemichal photolithography

Li Ding1, Qiu Mingxin1, and Kuang Zhong2
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    Li Ding, Qiu Mingxin, Kuang Zhong. Threshold and change characteristics of photolithographical rate in laser-induced gas-phase thermochemichal photolithography[J]. Chinese Journal of Lasers, 1987, 14(10): 614

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    Paper Information

    Category: laser devices and laser physics

    Received: Jul. 25, 1986

    Accepted: --

    Published Online: Aug. 10, 2012

    The Author Email:

    DOI:

    CSTR:32186.14.

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology