Journal of Inorganic Materials, Volume. 40, Issue 1, 91(2025)
High Quality GaN Epitaxy Induced Nucleation by Ar Ion Implantation into Sapphire Substrate
[1] SU H K, XU S R, TAO H C et al. Improving the current spreading by Fe doping in n-GaN layer for GaN-based ultraviolet light- emitting diodes.
[2] HE J Q, CHENG W C, WANG Q et al. Recent advances in GaN-based power HEMT devices.
[3] LI G Q, WEN L W, WEI J Y et al. GaN-based light-emitting diodes on various substrates: a critical review.
[4] NAKAMURA S. InGaN multiquantum-well-structure laser diodes with GaN-AlGaN modulation-doped strained-layer superlattices.
[5] BALIGA B J. Power semiconductor device figure of merit for high-frequency applications.
[6] GAO Y, XU S R, PENG R S et al. Comparative research of GaN growth mechanisms on patterned sapphire substrates with sputtered AlON nucleation layers.
[7] ZHAO Y, XU S R, FENG L et al. The performance improvement of AlGaN/GaN heterojunction by using nano-patterned sapphire substrate.
[8] DEGAVE F, RUTERANA P, NOUET G et al. Analysis of the nucleation of GaN layers on (0001) sapphire.
[9] CHEN J J, SU Y K, LIN C L et al. Enhanced output power of GaN-based LEDs with nano-patterned sapphire substrates.
[10] YI M S, LEE H H, KIM D J et al. Effects of growth temperature on GaN nucleation layers.
[11] YANG T, UCHIDA K, MISHIMA T et al. Control of initial nucleation by reducing the V/III ratio during the early stages of GaN growth.
[12] KHAN M S A, LIAO H, YU G et al. Reduction of threading dislocations in GaN grown on patterned sapphire substrate masked with serpentine channel.
[13] ZHELEVA T S, SMITH S A, THOMSON D B et al. Pendeo-epitaxy: a new approach for lateral growth of gallium nitride films.
[14] HE C, ZHAO W, ZHANG K et al. High-quality GaN epilayers achieved by facet-controlled epitaxial lateral overgrowth on sputtered AlN/PSS templates.
[15] LEE Y J, HWANG J M, HSU T C et al. Enhancing the output power of GaN-based LEDs grown on wet-etched patterned sapphire substrates.
[16] HIRAMATSU K, NISHIYAMA K, ONISHI M et al. Fabrication and characterization of low defect density GaN using facet-controlled epitaxial lateral overgrowth (FACELO).
[18] AMANO H, SAWAKI N, AKASAKI I et al. Metalorganic vapor phase epitaxial growth of a high quality GaN film using an AlN buffer layer.
[19] BAN K, YAMAMOTO J, TAKEDA K et al. Internal quantum efficiency of whole-composition-range AlGaN multiquantum wells.
[20] MORAM M A. X-ray diffraction of III-nitrides.
[21] YEN C H, LAI W C, YANG Y Y et al. GaN-based light-emitting diode with sputtered AlN nucleation layer.
[22] PARK J, MOON D, PARK S et al. Growth of GaN layer on patterned Al/Ti metal mask by metal-organic chemical vapor deposition.
[23] WANG L, WANG L, REN F et al. GaN grown on AlN/sapphire templates.
[24] LIANG F, ZHAO D G, JIANG D S et al. Role of Si and C impurities in yellow and blue luminescence of unintentionally and Si-doped GaN.
[25] RIEGER W, METZGER T, ANGERER H et al. Influence of substrate-induced biaxial compressive stress on the optical properties of thin GaN films.
[26] KOZAWA T, KACHI T, KANO H et al. Thermal stress in GaN epitaxial layers grown on sapphire substrates.
Get Citation
Copy Citation Text
Xia AN, Shengrui XU, Hongchang TAO, Huake SU, He YANG, Kang XU, Lei XIE, Jingyu JIA, Jincheng ZHANG, Yue HAO. High Quality GaN Epitaxy Induced Nucleation by Ar Ion Implantation into Sapphire Substrate[J]. Journal of Inorganic Materials, 2025, 40(1): 91
Category:
Received: Jun. 12, 2024
Accepted: --
Published Online: Apr. 24, 2025
The Author Email: Xia AN (2382744815@qq.com)