Acta Optica Sinica, Volume. 37, Issue 2, 216001(2017)
Damage-Removal and Passivation of Polycrystalline Black Silicon by Reactive Ion Etching
Figures & Tables(0)
Tools
Get Citation
Copy Citation Text
Jin Lei, Li Yufang, Shen Honglie, Jiang Ye, Yang Wangyang, Yang Nannan, Zheng Chaofan. Damage-Removal and Passivation of Polycrystalline Black Silicon by Reactive Ion Etching[J]. Acta Optica Sinica, 2017, 37(2): 216001
Paper Information
Category: Materials
Received: Sep. 1, 2016
Accepted: --
Published Online: Feb. 13, 2017
The Author Email:
© Copyright 2018-2021 | Chinese Laser Press.
All Rights Reserved 沪ICP备15018463号-20