Journals Articles Conferences News About CLP
Submit a paper Email Alert
Search
Search
Articles
Journals
News
Advanced Search
Top Searches
2D MaterialsTransformation opticsQuantum PhotonicsSmall lasersSemiconductor UV PhotonicsSupersymmetric microring laser arrays

Acta Optica Sinica, Volume. 37, Issue 2, 216001(2017)

Damage-Removal and Passivation of Polycrystalline Black Silicon by Reactive Ion Etching

Jin Lei, Li Yufang, Shen Honglie, Jiang Ye, Yang Wangyang, Yang Nannan, and Zheng Chaofan
Author Affiliations
  • [in Chinese]
    • show less
    AbstractGet PDF(in Chinese)
    Figures&Tables (0)
    Equations (0)
    References (15)
    Cited By (3)
    Tools
    Paper Information
    Topics
    Cited By

    Article index updated: Mar. 10, 2025

    The article is cited by 3 article(s) CLP online library. (Some content might be in Chinese.)
    Tools

    Get Citation

    Copy Citation Text

    Jin Lei, Li Yufang, Shen Honglie, Jiang Ye, Yang Wangyang, Yang Nannan, Zheng Chaofan. Damage-Removal and Passivation of Polycrystalline Black Silicon by Reactive Ion Etching[J]. Acta Optica Sinica, 2017, 37(2): 216001

    Download Citation

    EndNote(RIS)BibTexPlain Text
    Set citation alerts for article
    Save article for my favorites
    Paper Information

    Category: Materials

    Received: Sep. 1, 2016

    Accepted: --

    Published Online: Feb. 13, 2017

    The Author Email:

    DOI:10.3788/aos201737.0216001

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology