Infrared and Laser Engineering, Volume. 44, Issue 8, 2389(2015)
High-speed focusing technique for lithography based on line scan CCD
[1] [1] Yao Hanmin, Hu Song, Xing Tingwen. Nanofabrication Technology of Optic Projection Exposure[M]. Beijing: Beijing University of Technology Press, 2006. (in Chinese)
[2] [2] Masahiro Watanabe. Focusing and leveling based on wafer surface profile detection with interferometry [C]//SPIE, 1994, 2197: 809-989.
[3] [3] Yan Wei, Li Yanli, Chen Mingyong, et al. Moiré fringe-based focusing-test scheme for optical projection lithography[J]. Acta Optical Sinica, 2011, 31(8): 0805001-1-0805001-5. (in Chinese)
[4] [4] S1 series line scan CCD cameras user manual[Z]. Tianjin: Auto-measurement & Vision Technology Co., Ltd., 2013. (in Chinese)
[5] [5] AIA. Specifications of the camera link interface standard for digital cameras and frame grabbers v2.0 [S]. 2000.
[6] [6] Yang Boxiong. CCD subdivision technology and its application research [D]. Beijing: Institute of Geophysics, China Earthquake Administration, 2005. (in Chinese)
[7] [7] Wu Xiaobo, Zhong Xianxin, Liu Houquan. Improve the resolution of array CCD measurement by polynomial interpolation function [J]. Chinese Journal of Scientific Instrument, 1996, 17(2): 154-159. (in Chinese)
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Chen Changlong, Di Chengliang, Tang Xiaoping, Hu song. High-speed focusing technique for lithography based on line scan CCD[J]. Infrared and Laser Engineering, 2015, 44(8): 2389
Category: 光电测量
Received: Aug. 13, 2014
Accepted: Sep. 18, 2014
Published Online: Jan. 26, 2016
The Author Email: Changlong Chen (chenchanglong2013@163.com)
CSTR:32186.14.