High Power Laser and Particle Beams, Volume. 37, Issue 5, 054002(2025)

Total ionizing dose effect on gate drivers fabricated by BCD technology

Shiping Xu1,2, Jiangwei Cui1,2、*, Qiwen Zheng1,2, Gang Liu3, Kangwei Xing3, Xiaolong Li1,2, Weilei Shi1,2, Xin Wang1,2, Yudong Li1,2, and Qi Guo1,2
Author Affiliations
  • 1Xinjiang Key Laboratory of Extreme Environment Electronics, Key Laboratory of Functional Materials and Devices for Special Environmental Conditions, Xinjiang Technical Institute of Physics and Chemistry, Chinese Academy of Sciences, Urumqi 830011, China
  • 2University of Chinese Academy of Sciences, Beijing 100049, China
  • 3Beijing YanDong Microelectronic Co., Ltd., Beijing 100176, China
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    References(19)

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    [9] [9] Park I Y, Choi Y K, Ko K Y, et al. BCD (BipolarCMOSDMOS) technology trends f power management IC[C]Proceedings of the 8th International Conference on Power Electronics ECCE Asia. 2011: 318325.

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    [16] [16] Lai Rongxing, Fang Jian, Guan Xiaoming, et al. A radiationhard gate driver circuit f high voltage application[C]Proceedings of 2020 32nd International Symposium on Power Semiconduct Devices ICs (ISPSD). 2020: 262265.

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    Shiping Xu, Jiangwei Cui, Qiwen Zheng, Gang Liu, Kangwei Xing, Xiaolong Li, Weilei Shi, Xin Wang, Yudong Li, Qi Guo. Total ionizing dose effect on gate drivers fabricated by BCD technology[J]. High Power Laser and Particle Beams, 2025, 37(5): 054002

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    Paper Information

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    Received: Jul. 18, 2024

    Accepted: Jan. 15, 2025

    Published Online: May. 22, 2025

    The Author Email: Jiangwei Cui (cuijw@ms.xjb.ac.cn)

    DOI:10.11884/HPLPB202537.240235

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