Acta Optica Sinica, Volume. 24, Issue 9, 1285(2004)

Method for Controlling Groove Depth and Duty Cycle of Rectangular Photoresist Gratings

[in Chinese]1、*, [in Chinese]1, and [in Chinese]2
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
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    References(4)

    [3] [3] Wei Hongbo, Li Lifeng. All-dielectric reflection gratings: a study of physical mechanism for achieving high-efficiency. Appl. Opt., 2003, 42(31): 6255~6260

    [8] [8] Li L, Xu M, Stegeman G I et al.. Fabrication of photoresist masks for submicrometer surface relief gratings. Proc. SPIE, 1987, 835:72~82

    [9] [9] Britten J A, Boyd R D, Shore B W. In-situ end-point detection during development of submicrometer grating structures in photoresist. Opt. Engng., 1995, 34(2):474~479

    [10] [10] KAPPA is a grating simulation software written by Li Lifeng one of the authors

    CLP Journals

    [1] Hua Lin, Lifeng Li, Lijiang Zeng, "In-situ end-point detection during ion-beam etching of multilayer dielectric gratings," Chin. Opt. Lett. 3, 0263 (2005)

    [2] HAN Jian, Bayanheshig, LI Wen-hao, KONG Peng. Groove profile evolution of grating masks for different photoresist response curves in fabrication of holographic gratings[J]. Optics and Precision Engineering, 2012, 20(11): 2380

    [3] Han Jian, Bayanheshig, Li Wenhao, Kong Peng. Profile Evolution of Grating Masks According to Exposure Dose and Interference Fringe Contrast in the Fabrication of Holographic Grating[J]. Acta Optica Sinica, 2012, 32(3): 305001

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    [in Chinese], [in Chinese], [in Chinese]. Method for Controlling Groove Depth and Duty Cycle of Rectangular Photoresist Gratings[J]. Acta Optica Sinica, 2004, 24(9): 1285

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    Paper Information

    Category: Physical Optics

    Received: Jun. 23, 2003

    Accepted: --

    Published Online: Jun. 12, 2006

    The Author Email: (zhaojinsong@tsinghua.org.cn)

    DOI:

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