Chinese Journal of Lasers, Volume. 39, Issue 9, 908004(2012)

Study on Beam Stabilization Technique in Lithography Illumination System

Bao Jianfei1,2、*, Huang Lihua1, Zeng Aijun1, Ren Bingqiang1, Yang Baoxi1, Peng Xuefeng1, Hu Xiaobang1, and Huang Huijie1
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
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    References(12)

    [1] [1] L. Lublin, D. Warkentin, P. P. Das et al.. High-performance beam stabilization for next-generation ArF beam delivery systems[C]. SPIE, 2003, 5040: 1682~1693

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    [3] [3] H. Andersson. Position Sensitive Detectors: Device Technology and Applications in Spectroscopy[D]. Sundsvall: Mid Sweden University, 2008. 5~65

    [4] [4] L. J. HendriKus, G. W. Teeuwen. Lithographic Apparatus and Method to Determine Beam Characteristics[P]. US Patent, 6870603B2, 2005-03-22

    [5] [5] C. G. Chen, R. K. Heilmann, C. Joo et al.. Beam alignment for scanning beam interference lithography[J]. J. Vac. Sci. Technol. B, 2002, 20(6): 3071~3074

    [6] [6] Zhang Liang, Wang Jianyu, Jia Jianjun et al.. Design and performance of fine tracking system based on CMOS for quantum communication[J]. Chinese J. Lasers, 2011, 38(2): 0205008

    [7] [7] He Yuanxing, Li Xinyang. Analysis of influence of CCD′s nonlinear response characterization on measurement results of focal spot and beam quality[J]. Chinese J. Lasers, 2012, 39(4): 0408001

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    CLP Journals

    [1] Wang Wei, Bayanheshig, Pan Mingzhong, Song Ying, Li Wenhao. Beam Alignment Error and Its Control in Scanning Beam Interference Lithography System[J]. Acta Optica Sinica, 2017, 37(7): 722003

    [2] Cheng Weilin, Zhu Jing, Zhang Yunbo, Zeng Aijun, Huang Huijie. Status and Development of Scanning Beam Interference Lithography System[J]. Laser & Optoelectronics Progress, 2015, 52(10): 100001

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    Bao Jianfei, Huang Lihua, Zeng Aijun, Ren Bingqiang, Yang Baoxi, Peng Xuefeng, Hu Xiaobang, Huang Huijie. Study on Beam Stabilization Technique in Lithography Illumination System[J]. Chinese Journal of Lasers, 2012, 39(9): 908004

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    Paper Information

    Category: measurement and metrology

    Received: Apr. 19, 2012

    Accepted: --

    Published Online: Jul. 17, 2012

    The Author Email: Jianfei Bao (hkdbjf@163.com)

    DOI:10.3788/cjl201239.0908004

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