Chinese Journal of Lasers, Volume. 39, Issue 9, 908004(2012)

Study on Beam Stabilization Technique in Lithography Illumination System

Bao Jianfei1,2、*, Huang Lihua1, Zeng Aijun1, Ren Bingqiang1, Yang Baoxi1, Peng Xuefeng1, Hu Xiaobang1, and Huang Huijie1
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    Bao Jianfei, Huang Lihua, Zeng Aijun, Ren Bingqiang, Yang Baoxi, Peng Xuefeng, Hu Xiaobang, Huang Huijie. Study on Beam Stabilization Technique in Lithography Illumination System[J]. Chinese Journal of Lasers, 2012, 39(9): 908004

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    Paper Information

    Category: measurement and metrology

    Received: Apr. 19, 2012

    Accepted: --

    Published Online: Jul. 17, 2012

    The Author Email: Jianfei Bao (hkdbjf@163.com)

    DOI:10.3788/cjl201239.0908004

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