Beam stabilization technique is one of the most important techniques in modern lithography illumination system. It provides a stable light intensity distribution for the illumination system by stabilizing the pointing and position of laser beam transmitting a long distance. Beam stabilization system is composed of a beam measurement functional module and a beam steering functional module. The beam transfer matrix between two modules is deduced and an optoelectronic closed-loop control experimental system is built based on LabView. Performances of the system are tested by importing given beam drifting. The system pointing steady-state error is obtained to be better than ±3 μrad, the position steady-state error is better than ±0.04 mm, and the adjustment time is less than 80 ms. These results prove that the system can accurately stabilize the beam to specified pointing and position.