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Spectroscopy and Spectral Analysis, Volume. 30, Issue 6, 1670(2010)

Thickness Measurement of Ultrathin SiO2 Layer on Si by Using XPS Standard Curve

ZHAO Zhi-juan1、*, LIU Fen1, WANG Hai2, ZHAO Liang-zhong1, YAN Shou-ke1,3, and SONG Xiao-ping2
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  • 1[in Chinese]
  • 2[in Chinese]
  • 3[in Chinese]
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    ZHAO Zhi-juan, LIU Fen, WANG Hai, ZHAO Liang-zhong, YAN Shou-ke, SONG Xiao-ping. Thickness Measurement of Ultrathin SiO2 Layer on Si by Using XPS Standard Curve[J]. Spectroscopy and Spectral Analysis, 2010, 30(6): 1670

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    Paper Information

    Received: Jun. 18, 2009

    Accepted: --

    Published Online: Jan. 26, 2011

    The Author Email: ZHAO Zhi-juan (zhaozj@iccas.ac.cn)

    DOI:

    CSTR:32186.14.

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology