Acta Optica Sinica, Volume. 43, Issue 21, 2124002(2023)
Research on Formation Mechanism of Fused Silica Etched Morphology Based on Wall Reflection Enhancement Model
Fig. 2. Schematic of sample etching. (a) Plasma etching; (b) hydrofluoric acid etching
Fig. 4. Full spectra of elements of surface topography of sample etched by plasma and then hydrofluoric acid
Fig. 6. Scanning electron microscope (SEM) picture of surface topography of sample. (a) Initial surface topography before etching; (b) surface morphology etching by plasma; (c) surface morphology etching by plasma and then hydrofluoric acid
Fig. 8. Schematic of a wall reflection model based on micro-mask and distribution of etched particle quantity. (a) Schematic of a wall reflection model based on micro-mask; (b) quantity distribution of etching particles at different reference heights in the horizontal direction
Fig. 10. Cross sectional view of gold nanoparticles on surface of the component under atmospheric plasma etching
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Jun Chen, Lin Wang, Chaoyang Wei, Jianda Shao. Research on Formation Mechanism of Fused Silica Etched Morphology Based on Wall Reflection Enhancement Model[J]. Acta Optica Sinica, 2023, 43(21): 2124002
Category: Optics at Surfaces
Received: Apr. 18, 2023
Accepted: May. 31, 2023
Published Online: Nov. 8, 2023
The Author Email: Wang Lin (wanglin@siom.ac.cn)