Acta Optica Sinica, Volume. 43, Issue 21, 2124002(2023)

Research on Formation Mechanism of Fused Silica Etched Morphology Based on Wall Reflection Enhancement Model

Jun Chen1,2, Lin Wang1、*, Chaoyang Wei1, and Jianda Shao1
Author Affiliations
  • 1Precision Optical Manufacturing and Testing Center, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
  • 2College of Materials Science and Opto-Electronic Technology, University of Chinese Academy of Sciences, Beijing 100049, China
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    Figures & Tables(11)
    Schematic of the atmospheric plasma machine
    Schematic of sample etching. (a) Plasma etching; (b) hydrofluoric acid etching
    Surface morphology of sample etched by plasma and then hydrofluoric acid
    Full spectra of elements of surface topography of sample etched by plasma and then hydrofluoric acid
    C narrow spectra of surface topography of sample etched by plasma
    Scanning electron microscope (SEM) picture of surface topography of sample. (a) Initial surface topography before etching; (b) surface morphology etching by plasma; (c) surface morphology etching by plasma and then hydrofluoric acid
    Surface morphology of fused silica under SEM (50000× magnification)
    Schematic of a wall reflection model based on micro-mask and distribution of etched particle quantity. (a) Schematic of a wall reflection model based on micro-mask; (b) quantity distribution of etching particles at different reference heights in the horizontal direction
    SEM image of gold nanoparticles
    Cross sectional view of gold nanoparticles on surface of the component under atmospheric plasma etching
    • Table 1. Parameters of plasma etching processing

      View table

      Table 1. Parameters of plasma etching processing

      Driver powerGas flow rate of HeGas flow rate of CF4Gas flow rate of O2
      170 W1800 mL/min100 mL/min20 mL/min
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    Jun Chen, Lin Wang, Chaoyang Wei, Jianda Shao. Research on Formation Mechanism of Fused Silica Etched Morphology Based on Wall Reflection Enhancement Model[J]. Acta Optica Sinica, 2023, 43(21): 2124002

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    Paper Information

    Category: Optics at Surfaces

    Received: Apr. 18, 2023

    Accepted: May. 31, 2023

    Published Online: Nov. 8, 2023

    The Author Email: Wang Lin (wanglin@siom.ac.cn)

    DOI:10.3788/AOS230841

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