Research on Formation Mechanism of Fused Silica Etched Morphology Based on Wall Reflection Enhancement Model

Jun Chen; Lin Wang; Chaoyang Wei; Jianda Shao

doi:10.3788/AOS230841

Acta Optica Sinica, Volume. 43, Issue 21, 2124002(2023)

Research on Formation Mechanism of Fused Silica Etched Morphology Based on Wall Reflection Enhancement Model

Jun Chen^1,2, Lin Wang^1、*, Chaoyang Wei¹, and Jianda Shao¹

¹Precision Optical Manufacturing and Testing Center, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China

²College of Materials Science and Opto-Electronic Technology, University of Chinese Academy of Sciences, Beijing 100049, China

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Jun Chen, Lin Wang, Chaoyang Wei, Jianda Shao. Research on Formation Mechanism of Fused Silica Etched Morphology Based on Wall Reflection Enhancement Model[J]. Acta Optica Sinica, 2023, 43(21): 2124002

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Paper Information

Category: Optics at Surfaces

Received: Apr. 18, 2023

Accepted: May. 31, 2023

Published Online: Nov. 8, 2023

The Author Email: Wang Lin (wanglin@siom.ac.cn)

DOI:10.3788/AOS230841

Topics

laser devices and laser physics

Lasers and Laser Optics

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