Chinese Journal of Lasers, Volume. 51, Issue 7, 0701015(2024)

High-Precision Extreme Ultraviolet Reflectometry Based on Normalization

Liangle Zhang1,2, Xiaoquan Han1,2, Wanlu Xie1,2, Xiaobin Wu1,2、*, Xuchen Fang1,2, Zixiang Gao1,2, Pengfei Sha1,2, and Kuibo Wang1,2
Author Affiliations
  • 1R & D Center of Optoelectronic Technology, Institute of Microelectronics of the Chinese Academy of Sciences, Beijing 100029, China
  • 2University of Chinese Academy of Sciences, Beijing 100049, China
  • show less
    Figures & Tables(10)
    Schematic diagram of extreme ultraviolet reflectometer
    Single pulse energy of focused beam versus electric pulse energy
    Spectral response of detector. (a) AXUV100G; (b) SXUV100[20-21]
    Spectral response of two detectors as a function of injected electrical pulse energy from the light source
    Schematic diagram of normalization
    Variation curves of reference and experimental beam energy decay over time
    Reflectivity measurement curves of Mo/Si multilayer mirror. (a) Reflectivity-angle curves before normalization; (b) reflectivity-angle curves after normalization
    • Table 1. Signal-to-noise ratio of single-pulse energy for focused beams

      View table

      Table 1. Signal-to-noise ratio of single-pulse energy for focused beams

      Electric pulse energy /JFrequency /HzSignal to noise ratio /dB
      3.060043.09
      3.560043.35
      4.060043.06
    • Table 2. Variation of incidence beam energy over time

      View table

      Table 2. Variation of incidence beam energy over time

      Time /minReference beam /%Experiment beam /%Relative standard deviation /%
      52.02.40.63
      104.34.20.61
      156.26.20.64
    • Table 3. Variation of reflectivity repeatability near the center angle before and after normalization of Mo/Si multilayer mirror

      View table

      Table 3. Variation of reflectivity repeatability near the center angle before and after normalization of Mo/Si multilayer mirror

      Center anglePrecision before normalization /%Precision after normalization /%Improvement effect /%
      (22-0.5)°4.780.8981.5
      22°4.340.6984.1
      (22+0.5)°3.970.8880.0
    Tools

    Get Citation

    Copy Citation Text

    Liangle Zhang, Xiaoquan Han, Wanlu Xie, Xiaobin Wu, Xuchen Fang, Zixiang Gao, Pengfei Sha, Kuibo Wang. High-Precision Extreme Ultraviolet Reflectometry Based on Normalization[J]. Chinese Journal of Lasers, 2024, 51(7): 0701015

    Download Citation

    EndNote(RIS)BibTexPlain Text
    Save article for my favorites
    Paper Information

    Category: laser devices and laser physics

    Received: Sep. 1, 2023

    Accepted: Oct. 24, 2023

    Published Online: Apr. 17, 2024

    The Author Email: Wu Xiaobin (wuxiaobin@ime.ac.cn)

    DOI:10.3788/CJL231165

    CSTR:32183.14.CJL231165

    Topics