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Chinese Journal of Lasers, Volume. 51, Issue 7, 0701015(2024)

High-Precision Extreme Ultraviolet Reflectometry Based on Normalization

Liangle Zhang1,2, Xiaoquan Han1,2, Wanlu Xie1,2, Xiaobin Wu1,2、*, Xuchen Fang1,2, Zixiang Gao1,2, Pengfei Sha1,2, and Kuibo Wang1,2
Author Affiliations
  • 1R & D Center of Optoelectronic Technology, Institute of Microelectronics of the Chinese Academy of Sciences, Beijing 100029, China
  • 2University of Chinese Academy of Sciences, Beijing 100049, China
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    Article index updated: Sep. 8, 2025

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    Liangle Zhang, Xiaoquan Han, Wanlu Xie, Xiaobin Wu, Xuchen Fang, Zixiang Gao, Pengfei Sha, Kuibo Wang. High-Precision Extreme Ultraviolet Reflectometry Based on Normalization[J]. Chinese Journal of Lasers, 2024, 51(7): 0701015

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    Paper Information

    Category: laser devices and laser physics

    Received: Sep. 1, 2023

    Accepted: Oct. 24, 2023

    Published Online: Apr. 17, 2024

    The Author Email: Xiaobin Wu (wuxiaobin@ime.ac.cn)

    DOI:10.3788/CJL231165

    CSTR:32183.14.CJL231165

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology