Microelectronics, Volume. 55, Issue 1, 159(2025)
Study on High Sensitivity and Low Offset Hall Device Based on 0.18 μm BCD Process
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LI Jielin, LI Jianqiang, LI Liang, ZHOU Lin, WANG Shuangxi, XU Yue. Study on High Sensitivity and Low Offset Hall Device Based on 0.18 μm BCD Process[J]. Microelectronics, 2025, 55(1): 159
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Received: Apr. 29, 2024
Accepted: Jun. 19, 2025
Published Online: Jun. 19, 2025
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