Microelectronics, Volume. 55, Issue 1, 159(2025)

Study on High Sensitivity and Low Offset Hall Device Based on 0.18 μm BCD Process

LI Jielin1, LI Jianqiang2, LI Liang2, ZHOU Lin1, WANG Shuangxi1, and XU Yue1,3
Author Affiliations
  • 1College of Integrated Circuit Science and Engineering, Nanjing University of Posts and Telecommunications, Nanjing, 210023, P. R. China
  • 2Beijing Smartchip Microelectronics Technology Company Limited, Beijing 102200, P. R. China
  • 3National and Local Joint Engineering Laboratory of RF Integration & Micro-assembly Technology, Nanjing, 210023, P. R. China
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    References(9)

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    [4] [4] ZOU H C, LEI K M, MARTINS R P, et al. A CMOS hall sensors array with integrated readout circuit resilient to local magnetic interference from current-carrying traces[J]. IEEE Sensors Journal, 2023, 23(14): 16145-16153.

    [5] [5] ZHANG L, ZHENG G Q, LI Y C, et al. An economical three-dimension (3-D) hall device on 0.15-m bipolar-CMOS-DMOS (BCD) platform[J]. IEEE Sensors Journal, 2024, 24(7): 9828-9834.

    [6] [6] LYU F, LIU X F, DING Y J, et al. Influences of an aluminum covering layer on the performance of cross-like hall devices[J]. Sensors, 2016, 16(1): 106.

    [7] [7] RANDJELOVIC Z B, KAYAL M, POPOVIC R, et al. Highly sensitive Hall magnetic sensor microsystem in CMOS technology[J]. IEEE Journal of Solid-State Circuits, 2002, 37(2): 151-159.

    [9] [9] SYEDA S F, CRESCENTINI M, MARCHESI M, et al. A wideband and low-noise CMOS-integrated X-hall current sensor operating in current mode[J]. IEEE Transactions on Instrumentation and Measurement, 2023, 72: 1-11.

    [10] [10] XU Y, WANG B, HU X X, et al. A CMOS front-end hall sensor microsystem for linear magnetic field measurement with best tradeoff between sensitivity and SNR[J]. IEEE Transactions on Instrumentation and Measurement, 2022, 71: 2000808.

    [11] [11] TOH E H, SUN Y S, ZHENG P, et al. A modular three-dimensional Hall effect sensor for performance optimization[J]. IEEE Sensors Journal, 2022, 22(12): 11256-11263.

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    LI Jielin, LI Jianqiang, LI Liang, ZHOU Lin, WANG Shuangxi, XU Yue. Study on High Sensitivity and Low Offset Hall Device Based on 0.18 μm BCD Process[J]. Microelectronics, 2025, 55(1): 159

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    Paper Information

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    Received: Apr. 29, 2024

    Accepted: Jun. 19, 2025

    Published Online: Jun. 19, 2025

    The Author Email:

    DOI:10.13911/j.cnki.1004-3365.240138

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